Home > Press > IEDM - CEA-Leti Will Present 11 Papers and Host Workshop on Disruptive Technologies for Data Management
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Abstract:
Leti, a technology research institute of CEA Tech, will present 11 papers at IEDM 2018 in San Francisco, Dec. 3-5, including one invited paper on scalable silicon quantum computing. It also will host a workshop covering “Disruptive Technologies for Data Management” on Sunday, Dec. 2, at the Nikko Hotel, anchored by a keynote talk from John Paul Strachan, senior researcher at HPE.
CEA-Leti’s workshop, an annual event for invited guests at the IEDM conference, begins at 5:30 p.m. Presentations include:
o Welcome & Introduction, Emmanuel Sabonnadičre, CEA-Leti CEO
o Technologies for New Computing Paradigms, Carlo Reita, CEA-Leti
o Enabling Heterogeneous High Performance Processors, Denis Dutoit, CEA-Leti
o Special Key note, John Paul Strachan – HPE
o Emerging Non-Volatile Memories for Computing, Marie-Claire Cyrille, CEA-Leti
o Quantum Computing on Silicon : Maud Vinet, CEA-Leti
CEA-Leti’s papers at IEDM include:
Monday, Dec. 3
Session 7.2: Breakthroughs in 3D Sequential Technology
Time: 2:00 pm
Location: Continental Ballroom 5
Session 6.2: Towards Scalable Silicon Quantum Computing (invited)
Time: 2:00 pm
Location: Continental Ballroom 5
Session 7.3: Hybrid Bonding for 3D Stacked Image Sensors: Impact of Pitch Shrinkage on Interconnect Robustness
Time: 2:25 pm
Location: Continental Ballroom 6
Tuesday, Dec. 4
Session 12.4: Very Large Scale Integration Optomechanics: A Cure for Loneliness of NEMS Resonators?
Time: 9:00 am
Continental Ballroom 1-3
Session 17.1 Characterization Methodology and Physical Compact Modeling of in-Wafer Global and
Local Variability
Time: 9:05 am
Location: Plaza B
Session 17.6: Development of X-ray Photoelectron Spectroscopy Under Bias and its Application to Determine Band-energies and Dipoles in the HKMG Stack
Time: 11:35 am
Location: Plaza B
Session 20.3: In-depth Characterization of Resistive Memory-based Ternary Content Addressable
Memories
Time: 3:10 pm
Location: Continental Ballroom 4
Session 21.3: Tunability of Parasitic Channel in Gate-All-Around Stacked Nanosheets
Time: 3:10 pm
Location: Continental Ballroom 5
Session 18.4: Truly Innovative 28nm FDSOI Technology for Automotive Micro-Controller Applications Embedding 16MB Phase Change Memory
Time: 4:00 pm
Location: Grand Ballroom B
Session 20.6: In-Memory and Error-Immune Differential RRAM Implementation of Binarized Deep
Neural Networks
Time: 4:50 pm
Location: Continental Ballroom 4
Wednesday, Dec. 5
Session 37.4: Optimized Reading Window for Crossbar Arrays Thanks to Ge-Se-Sb-N-based OTS
Selectors
Time: 2:50 pm
Location: Continental Ballroom 4
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About Leti
Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro-& nanotechnologies, tailoring differentiating applicative solutions for global companies, SMEs and startups. Leti tackles critical challenges in healthcare, energy and digital migration. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities. With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network. This year, the institute celebrates its 50th anniversary. Follow us on www.leti-cea.com and @CEA_Leti.
Follow us on www.leti.fr/en and @CEA_Leti.
CEA Tech is the technology research branch of the French Alternative Energies and Atomic Energy Commission (CEA), a key player in innovative R&D, defence & security, nuclear energy, technological research for industry and fundamental science, identified by Thomson Reuters as the second most innovative research organization in the world. CEA Tech leverages a unique innovation-driven culture and unrivalled expertise to develop and disseminate new technologies for industry, helping to create high-end products and provide a competitive edge.
For more information, please click here
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