Nanotechnology Now - Press Release: Picosun introduces several industrially scalable ALD processes Source: Picosun Oy

Home > Press > Picosun introduces several industrially scalable ALD processes Source: Picosun Oy

Abstract:
Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, has successfully scaled up several new, important ALD processes. Of compound materials, various new sulfides, e.g. Gd2O2S (based on the process originally developed by Prof. Mikko Ritala's group at University of Helsinki, Finland), indium sulfide and zinc sulfide, and oxides, e.g. antimony oxide and Al2O3/Ta2O5 nanolaminates and mixed oxides (also at lower temperatures), are now available for industrial scale processes. Of metals, gold, copper, silver and ruthenium, and of metallic compound materials, TiAlCN and TiN, have also been successfully deposited by novel ALD processes on industrial scale wafer sizes.

Picosun introduces several industrially scalable ALD processes Source: Picosun Oy

Espoo, Finland | Posted on November 30th, 2011

The new sulfides and oxides have various applications in e.g. optics, electronics and display industries and as multifunctional protective layers. ALD deposited metal/metallic layers, on the other hand, find their customers especially in MEMS/NEMS (Micro/Nanoelectromechanical systems) and other electronics and integrated circuits industries, where e.g. through-silicon-vias (TSV) and other high aspect ratio (HAR) structures are a common approach in modern 3D-stacked chip architectures. When the via or HAR trench dimensions narrow down to nanometer scale, ALD is the only possible thin film coating method with which e.g. contact metallization, seed, barrier or adhesion layers can be deposited with satisfactory conformality, uniformity and pinhole-free quality.

"In order to keep our spearheading position in serving world-class industrial customers, it is of utmost importance to stay in the lead also in ALD process development. Picosun's close connections to top level ALD research groups worldwide and the unrivaled ALD expertise of our own personnel make Picosun always your number one partner, not only as ALD equipment provider, but also in ALD process development. With Picosun's efficient and innovative production-scale high throughput ALD tool design, the process scale-up is fast and easy and never compromises Picosun's trademark, unparalleledly excellent film and process quality," summarizes Picosun's Managing Director Juhana Kostamo.

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About Picosun Oy
Picosun Oy is a Finland-based global manufacturer of state-of-the-art ALD systems, representing continuity to almost four decades of dedicated, exclusive ALD reactor design and manufacturing. Picosun’s global headquarters are located in Espoo, Finland, its production facilities in Masala, Kirkkonummi, and its US headquarters in Detroit, Michigan. Picosun’s SUNALE™ ALD tools are chosen for production by various industries across four continents. Picosun Oy is a part of Stephen Industries Inc. Oy.

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Contacts:
Mr. Juhana Kostamo
Phone: +358 50 321 1955
Fax: +358 20 722 7012

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