Nanotechnology Now - Press Release: JSR Joins SEMATECH’s Resist Center at UAlbany NanoCollege

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Abstract:
Collaboration to provide cost-effective semiconductor materials for 22nm nodes

JSR Joins SEMATECH’s Resist Center at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on May 11th, 2010

SEMATECH, a global consortium of chipmakers, and JSR Corporation, an advanced materials supplier to chip-makers and others, and its U.S. operation, JSR Micro, Inc. announced today that it has become the newest member of SEMATECH's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

JSR will collaborate with SEMATECH engineers on key resist issues in extreme ultraviolet (EUV) lithography. Focus areas will include:

· Working to reduce or eliminate line edge roughness (LER) in lithographic images below 22 nm

· Discovering ultimate resolution of newly formulated photoresists

· Testing various imaging materials for EUV sensitivity

SEMATECH and JSR have partnered previously in several technology development programs, including 300 mm test wafers, low-k films, and advanced resists, including double exposure materials.

"We have a successful history of partnership with SEMATECH and we are excited to continue that history in the field of EUV," said Hozumi Sato, managing director of JSR Corporation, responsible for the Research and Development. "Combining resources to create next generation of EUV materials is not only good for JSR and SEMATECH, but will benefit the industry as a whole."

"We're looking forward to working with JSR in our mutual effort to develop leading‑edge resists and materials, and accelerate process availability for EUV pilot line manufacturing," said John Warlaumont, vice president of Advanced Technology at SEMATECH. "Our successful experience in our previous partnerships will contribute greatly to RMDC's effectiveness."

"The addition of JSR to the roster of global companies at CNSE's Albany NanoTech Complex will further enhance the SEMATECH-CNSE partnership in driving leading-edge nanoelectronics innovations," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia. "This collaboration is enabling advances in a host of technologies, including EUV lithography, which are critical to industry."

At the RMDC, leading resist and materials suppliers participate in focused, cooperative R&D with SEMATECH member companies. Together, the RMDC provides the hardware and research expertise required by materials suppliers and member companies to develop EUV resist processes that meet the stringent resolution, linewidth roughness, and sensitivity specifications needed for EUV insertion at member companies.

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About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About JSR Corporation
Tokyo based JSR Corporation is an advanced manufacturer in polymer chemistry, it operates a wide range of global businesses ranging from the petrochemical business, including the manufacture of synthetic rubber, to the cutting-edge information and electronic materials business, including the manufacture of semiconductor materials and liquid crystal display materials. For more information, visit www.jsr.co.jp.

About CNSE
The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

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Contacts:
SEMATECH
Erica McGill, 518-649-1041

JSR Corporation (Japan)
Yoshiko Takeda, 81-3-6218-3517

CNSE
Steve Janack, 518-956-7322

JSR Micro, Inc. (US)
Missy Bindseil, 408-543-8945