Home > News > Software Giants and Startups Tackle Lithography Complexity
March 14th, 2008
Software Giants and Startups Tackle Lithography Complexity
Abstract:
This year's conference, which took place again a couple weeks ago in San Jose, featured several announcements from the key players in the EDA space — such as Mentor Graphics, Synopsys, Cadence, Brion Technologies, Luminescent — and also carried the buzz about a couple of the latest newcomers, including Gauda and Tela Innovations. Much of the focus was on getting all the incredible amounts of data that are the necessary outcome of increasingly complex masks through the pipeline. Of course there was much talk about double patterning, and what the software providers are doing to solve key design splitting issues, but there was also talk about how they could help chipmakers avoid double patterning for just a little while longer.
Understandably, a great deal of buzz centered around the eventuality of relying on double patterning techniques to bridge the gap between water-based immersion lithography and extreme ultraviolet (EUV) lithography. While there are such issues as overlay requirements that fall into the purview of the toolmakers, there was much to be said from the EDA folks about how the design layers would be split into their respective masks.
Brion Technologies, for example, came out with its announcement the first day of the conference regarding two products — particularly its Tachyon DPT — that are better equipped to deal with computational lithography as it relates to double patterning.
Source:
semiconductor.net
Bookmark:
| Related News Press |
News and information
Simulating magnetization in a Heisenberg quantum spin chain April 5th, 2024
NRL charters Navy’s quantum inertial navigation path to reduce drift April 5th, 2024
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Chip Technology
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Utilizing palladium for addressing contact issues of buried oxide thin film transistors April 5th, 2024
HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024
Interviews/Book Reviews/Essays/Reports/Podcasts/Journals/White papers/Posters
Simulating magnetization in a Heisenberg quantum spin chain April 5th, 2024
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Printing/Lithography/Inkjet/Inks/Bio-printing/Dyes
Presenting: Ultrasound-based printing of 3D materials—potentially inside the body December 8th, 2023
Simple ballpoint pen can write custom LEDs August 11th, 2023
Disposable electronics on a simple sheet of paper October 7th, 2022
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||