Home > News > Toshiba Validates Imprint Lithography for <32 nm
October 16th, 2007
Toshiba Validates Imprint Lithography for <32 nm
Abstract:
Molecular Imprints Inc. (MII, Austin, Texas) today announced that Toshiba Semiconductor Co. (Tokyo) has validated the use of MII's imprint lithography technology for 22 nm node CMOS devices.
Using MII's Imprio 250 system, the memory manufacturer was able to print 18 nm isolated features and 24 nm dense features with <1 nm critical dimension uniformity (CDU) and <2 nm line edge roughness (LER). The Toshiba demonstrations also showed improved defectivity and overlay results for imprint lithography. Defectivity levels of as low as <0.3 defects per cm2 are approaching those of immersion lithography, and device overlay results were also within Toshiba's required specifications. "It's a very clear demonstration that we've got lithographic capability for 32 nm and below," said Mark Melliar-Smith, MII's CEO.
Source:
semiconductor.net
Bookmark:
| Related News Press |
Chip Technology
A reusable chip for particulate matter sensing April 17th, 2026
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
Announcements
A fundamentally new therapeutic approach to cystic fibrosis: Nanobody repairs cellular defect April 17th, 2026
UC Irvine physicists discover method to reverse ‘quantum scrambling’ : The work addresses the problem of information loss in quantum computing system April 17th, 2026
Printing/Lithography/Inkjet/Inks/Bio-printing/Dyes
Presenting: Ultrasound-based printing of 3D materials—potentially inside the body December 8th, 2023
Simple ballpoint pen can write custom LEDs August 11th, 2023
Disposable electronics on a simple sheet of paper October 7th, 2022
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||