Nanotechnology Now - Press Release: Nanometrics Announces Multi-System Integrated Metrology Order from Leading Foundry: Optical CD Solution for 22nm Gate Etch Control includes Integrated Systems and Complete NanoCD Suite

Home > Press > Nanometrics Announces Multi-System Integrated Metrology Order from Leading Foundry: Optical CD Solution for 22nm Gate Etch Control includes Integrated Systems and Complete NanoCD Suite

Abstract:
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced a multi-system order from a leading semiconductor foundry for its Integrated Metrology (IM) and NanoCD™ suite solutions. The systems will be delivered in the fourth quarter of this year for optical critical dimension (OCD) metrology on 22nm gate etch applications.

Nanometrics Announces Multi-System Integrated Metrology Order from Leading Foundry: Optical CD Solution for 22nm Gate Etch Control includes Integrated Systems and Complete NanoCD Suite

Milpitas, CA | Posted on November 2nd, 2009

"Nanometrics' IM systems and our industry leading NanoCD suite were chosen by a leading foundry partner to support advanced 22nm gate patterning process control," commented Steve Bradley, Director of Nanometrics' Integrated Metrology Business Unit. "The IM systems will be fully integrated onto advanced etch process systems from two leading etch equipment suppliers at multiple steps in the gate formation loop. The customer will deploy our 9010T IM systems combined with our NanoDiffract™ OCD software and NanoGen™ cluster computing hardware, enabling complex 3D gate metrology and rigorous real-time analysis to allow rapid information turns in a dynamic technology development factory."

Beyond etch integrations, Nanometrics' IM solutions are available in configurations to support control of other key fab processes, including CMP, lithography and CVD for both thin film and OCD applications. Nanometrics' IM can also be combined with Nanometrics' Lynx platform to provide superior measurement capability at a low cost of ownership. Nanometrics' customers can deploy integrated metrology in conjunction with standalone systems, the Lynx Cluster Metrology Platform and the NanoCD suite for a complete fab-wide metrology process control solution.

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About Nanometrics Incorporated
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, advanced wafer-scale packaging, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control, topography, and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process, from front end of line substrate manufacturing through die preparation for advanced packaging. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.

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Contacts:
Company Contact:
Kevin Heidrich
Nanometrics Incorporated
408.545.6000
408.317.1346 fax

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Claire McAdams
Headgate Partners LLC
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