Home > News > Nanotech Needs Metrology to Achieve Full Potential
November 16th, 2007
Nanotech Needs Metrology to Achieve Full Potential
Abstract:
For nanotech to evolve from the laboratory and R&D arena, new ways must be devised to use traditional metrology platforms such as the SEM and atomic force microscopy (AFM), as well as new measurement technologies. This was the assessment of Darlene Solomon, CTO for Agilent Technologies (Santa Clara, Calif.), in her keynote presentation at the Nanocon International conference held in Santa Clara, Calif.
Quoting Rear Admiral Grace Murray Hopper's remark that "One accurate measurement is worth one thousand expert opinions," Solomon stated that since measurement is the cornerstone of scientific progress, it is therefore a primary driver in getting nanotech to reach its full potential. "As our ability to measure improves, we learn new things about how nature works. We then use what we learned to develop new technologies that, in turn, help us develop new measurements," she said.
Source:
semiconductor.net
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