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Home > News > Obducat receives first NIL patent granted in Japan

August 4th, 2006

Obducat receives first NIL patent granted in Japan

Abstract:
Obducat have received notification from the Japanese patent office that it will issue a patent for an invention concerning functionality within Obducat’s NIL technology (nano imprint lithography) called parallelization. The technology offers performance advantages in comparison with competing parallelization technologies.

Source:
Obducat

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