July 2nd, 2006
Life after DFM
Abstract:
Breakthroughs in process technology could also make custom design more viable at the newest nodes, according to Rich Wawrzyniak, an analyst at Semico Research. "Employing nanotech in chip manufacturing might make nonphotographic processes more efficient," he says, "making it easier to design chips at an acceptable yield without the extra overhead of DFM."
Source:
reed-electronics.com
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