Home > News > OPC for hyper-NA works at 45-nm, says Synopsys
October 4th, 2005
OPC for hyper-NA works at 45-nm, says Synopsys
Abstract:
EDA software vendor Synopsys, Inc. said it is involved in a joint program with the Sematech research consortium to develop optical proximity correction (OPC) models to allow optical lithography to be used with manufacturing processes at 45-nanometer and beyond.
Source:
EETimes
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