Nanotechnology Now - Press Release: "First Nano Ships UHV SiGe Nanowire System to CEA / Grenoble, France"

Home > Press > First Nano Ships UHV SiGe Nanowire System to CEA / Grenoble, France

Abstract:
First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV), announced today the shipment of a Silicon-Germanium Chemical Vapor Deposition System to CEA Grenoble. The EasyTube 3000, Easy Gas and Easy Exhaust systems were configured specifically for Silicon-Germanium Nanowires and are, to the best of our knowledge, the first commercial turn-key system offered for this type of material growth.

First Nano Ships UHV SiGe Nanowire System to CEA / Grenoble, France

RONKONKOMA, NY | Posted on June 2nd, 2008

The CEA, French Atomic Energy Commission, is a public body established in 1945. As a leader in research, development and innovation, the CEA (http://www.cea.fr/english_portal) is active in three main fields: Energy, Information & Health Technologies and Defense & National Security. In each of these fields, the CEA maintains a cross-disciplinary culture of engineers and researchers, building upon the synergies between fundamental and technological research. The Silicon Nanoelectronics Photonics and Structures (SiNaPS) (http://inac.cea.fr/en/Phocea/Vie_des_labos/Ast/ast_groupe.php?id_groupe=152) laboratory is located in Grenoble, France within the Minatec(R) (http://www.minatec.com/minatec_uk/index.htm) center and belongs to the Institute for Nanoscience and Cryogenics of CEA (INAC) (http://inac.cea.fr/en/). The laboratory is committed to research on physics and optics of low-dimensional silicon based nanostructures and their applications to the emerging fields of nanophotonics and nanoelectronics.

The SiNaPS laboratory will use the system to further develop research programs on semiconductor nanowires. These programs are in close collaboration with the Laboratorie des Technologies de la Microelectronique (LTM) and the Centre National de la Recherche Scientifique (CNRS) which also took part in funding the system. "The purchase of the EasyTube3000 will enlarge the spectrum of our research with the growth of heterostructured nanowires, their doping, and with the possibility to extend the growth to a wide variety of other materials thanks to the liquid precursor kits. Our projects cover fundamental aspects (growth, carrier transport ... ) as well as potential applications (Nano Electronics, Solar Energy, Nanophotonics, MEMS and Sensors," states Pascal Gentile, Engineer from CEA.

To date, SiGe Nanowires have been produced in a few research laboratories by UHVCVD. It remains a challenge to control the diameter, length, uniformity and purity of the synthesized SiGe Nanowires because of their low dimensionality. First Nano's EasyTube ET3000 system provides the precise control of pressure, chemical delivery and temperature for SiGe Nanowire synthesis. "The integrated turn-key system expands our international installed base of equipment designed for enabling tomorrow's technology(TM)," states Gary Dyal, Director, Marketing/Sales of First Nano.

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About First Nano and CVD Equipment Corporation
First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV) (cvdequipment.com), is a designer and manufacturer of standard and custom state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications. We offer a broad range of chemical vapor deposition, gas control, and other equipment that is used by our customers to research, design and manufacture Semiconductors, Solar Cells, Carbon Nanotubes, Nanowires, LEDs, MEMS and Industrial Coatings.

This press release contains forward-looking statements set within the meaning of the Private Securities Litigation Reform Act of 1995, except for historical information contained herein; the matters set forth in this news release are forward-looking statements. Readers should note that the forward- looking statements set forth above involve a number of risks and uncertainties that could cause actual results to differ materially from any such statement, including, without limitation, the uncertainties discussed under the caption "Risk Factors" in the Company’s Registration Statement on Form S-1 filed with the SEC on July 3, 2007, as subsequently amended, which discussion is incorporated herein by reference. Readers should also read the periodic filings and current Form 8-K reports of the Company.

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