Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > First Nano Ships UHV SiGe Nanowire System to CEA / Grenoble, France

Abstract:
First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV), announced today the shipment of a Silicon-Germanium Chemical Vapor Deposition System to CEA Grenoble. The EasyTube 3000, Easy Gas and Easy Exhaust systems were configured specifically for Silicon-Germanium Nanowires and are, to the best of our knowledge, the first commercial turn-key system offered for this type of material growth.

First Nano Ships UHV SiGe Nanowire System to CEA / Grenoble, France

RONKONKOMA, NY | Posted on June 2nd, 2008

The CEA, French Atomic Energy Commission, is a public body established in 1945. As a leader in research, development and innovation, the CEA (http://www.cea.fr/english_portal) is active in three main fields: Energy, Information & Health Technologies and Defense & National Security. In each of these fields, the CEA maintains a cross-disciplinary culture of engineers and researchers, building upon the synergies between fundamental and technological research. The Silicon Nanoelectronics Photonics and Structures (SiNaPS) (http://inac.cea.fr/en/Phocea/Vie_des_labos/Ast/ast_groupe.php?id_groupe=152) laboratory is located in Grenoble, France within the Minatec(R) (http://www.minatec.com/minatec_uk/index.htm) center and belongs to the Institute for Nanoscience and Cryogenics of CEA (INAC) (http://inac.cea.fr/en/). The laboratory is committed to research on physics and optics of low-dimensional silicon based nanostructures and their applications to the emerging fields of nanophotonics and nanoelectronics.

The SiNaPS laboratory will use the system to further develop research programs on semiconductor nanowires. These programs are in close collaboration with the Laboratorie des Technologies de la Microelectronique (LTM) and the Centre National de la Recherche Scientifique (CNRS) which also took part in funding the system. "The purchase of the EasyTube3000 will enlarge the spectrum of our research with the growth of heterostructured nanowires, their doping, and with the possibility to extend the growth to a wide variety of other materials thanks to the liquid precursor kits. Our projects cover fundamental aspects (growth, carrier transport ... ) as well as potential applications (Nano Electronics, Solar Energy, Nanophotonics, MEMS and Sensors," states Pascal Gentile, Engineer from CEA.

To date, SiGe Nanowires have been produced in a few research laboratories by UHVCVD. It remains a challenge to control the diameter, length, uniformity and purity of the synthesized SiGe Nanowires because of their low dimensionality. First Nano's EasyTube ET3000 system provides the precise control of pressure, chemical delivery and temperature for SiGe Nanowire synthesis. "The integrated turn-key system expands our international installed base of equipment designed for enabling tomorrow's technology(TM)," states Gary Dyal, Director, Marketing/Sales of First Nano.

####

About First Nano and CVD Equipment Corporation
First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV) (cvdequipment.com), is a designer and manufacturer of standard and custom state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications. We offer a broad range of chemical vapor deposition, gas control, and other equipment that is used by our customers to research, design and manufacture Semiconductors, Solar Cells, Carbon Nanotubes, Nanowires, LEDs, MEMS and Industrial Coatings.

This press release contains forward-looking statements set within the meaning of the Private Securities Litigation Reform Act of 1995, except for historical information contained herein; the matters set forth in this news release are forward-looking statements. Readers should note that the forward- looking statements set forth above involve a number of risks and uncertainties that could cause actual results to differ materially from any such statement, including, without limitation, the uncertainties discussed under the caption "Risk Factors" in the Company’s Registration Statement on Form S-1 filed with the SEC on July 3, 2007, as subsequently amended, which discussion is incorporated herein by reference. Readers should also read the periodic filings and current Form 8-K reports of the Company.

For more information, please click here

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A new, tunable device for spintronics: An international team of scientists including physicist Jairo Sinova from the University of Mainz realises a tunable spin-charge converter made of GaAs August 29th, 2014

Nanoscale assembly line August 29th, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Nanoelectronics

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

3-D nanostructure could benefit nanoelectronics, gas storage: Rice U. researchers predict functional advantages of 3-D boron nitride July 15th, 2014

Announcements

A new, tunable device for spintronics: An international team of scientists including physicist Jairo Sinova from the University of Mainz realises a tunable spin-charge converter made of GaAs August 29th, 2014

Nanoscale assembly line August 29th, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Tools

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Ultra-Low Frequency Vibration Isolation Stabilizes Scanning Tunneling Microscopy at UCLA’s Nano-Research Group August 28th, 2014

Measure Both Elastic and Viscous Properties with AFM Using Asylum Research’s Exclusive AM-FM Viscoelastic Mapping Mode August 28th, 2014

Malvern specialists to deliver inaugural short course on polymer characterization at Interplas 2014 August 27th, 2014

Photonics/Optics/Lasers

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Fonon Announces 3D Metal Sintering Technology: Emerging Additive Nano Powder Manufacturing Technology August 28th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

Symphony of nanoplasmonic and optical resonators leads to magnificent laser-like light emission August 26th, 2014

New-Contracts/Sales/Customers

East China University of Science and Technology Purchases Nanonex Advanced Nanoimprint Tool NX-B200 July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

STFC takes delivery of the 100th Hitachi Tabletop SEM in the UK July 3rd, 2014

University of Maastricht Adds Complete Correlative Workflow from FEI to its Institute of Nanoscopy June 23rd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE