Nanotechnology Now - Press Release: Park Systems New XE-70 AFM/SPM with Decoupled XY and Z Scanners Eliminates Artifacts from Cross-Talk in Images

Home > Press > Park Systems New XE-70 AFM/SPM with Decoupled XY and Z Scanners Eliminates Artifacts from Cross-Talk in Images

Abstract:
Research-grade XE-70 Atomic Force/Scanning Probe Microscope with Flexible Sample Handling Overcomes Limitations of Tube Scanners, Produces Accurate Images.

Park Systems New XE-70 AFM/SPM with Decoupled XY and Z Scanners Eliminates Artifacts from Cross-Talk in Images

SANTA CLARA, CA | Posted on May 23rd, 2007

Park Systems Corp. (www.parkafm.com), a global provider of nanoscale measurement systems for research and industry, will demonstrate its new XE-70 Atomic Force Microscope/Scanning Probe Microscope (AFM/SPM). The XE-70 is designed to be used in laboratories to measure samples up to 100 mm in XY and 20 mm in Z. Park Systems will demonstrate the XE-70 AFM/SPM in Booth 805 at Nanotech 2007, May 22-23 at the Santa Clara Convention Center, Santa Clara, CA.

According to Park Systems' Vice President of Operations, Dr. Sung Park, many AFMs still use a derivative of the original piezoelectric tube scanner that was invented in the 1980's. While at the time, the tube scanner was a versatile, low-cost tool for acquiring attractive images, it was never ideal for obtaining accurate parameters of surface features and was subject to cross-talk.

"To overcome these limitations, Park Systems developed the ‘Cross-Talk Elimination' (XE) Series of AFM/SPMs," said Dr. Park. "The new XE-70 AFM features decoupled XY and Z scanners to minimize background curvature to two nanometers over 50 microns in XY - this is equivalent to about two inches over one mile. Essentially, there is no intrinsic bowing, even on the flattest sample, so there's no need to post-massage your data. Thus, there's no danger of eliminating any subtle information about the sample's surface features."

In recognition of innovations advancing AFM scanner technology, the XE Series was awarded Korea's IR52 Jang Young Shil Award, the Industrial Technology Innovation Award, and was selected as one of Korea's Ten Best New Technologies of 2004.

Additional features of the XE-70 AFM/SPM include:

* Distortion-free imaging and absolute scaling of AFM measurements enabled by a closed-loop feedback system driving all AFM signals.
* Faster, more accurate scanning. The high resonant frequency of the Z scanner provides rapid feedback to accurately track surface features at higher scan speeds.
* Preserves probe tip sharpness and sample purity. Probes follow the steep curvature of a sample precisely in True Non-Contact mode without crashing or being pulled to the surface by Van der Waals force.
* Stable operations. Super-Luminescence Diode (SLD)-based cantilever deflection/detection eliminates mode-hopping-induced noise from laser diodes. This minimizes interactions with optically sensitive samples and eliminates warm-up time.
* Easy probe placement with on-axis optical view of the probe and sample.
* Unprecedented clarity from direct, on-axis straight-down-looking optical view.
* Accurate feature identification enabled by extremely high (1 micron resolution) optical magnification.
* Large sample capacity (up to 100 x 100 x 20 mm thick) eliminates the need to cut up samples before imaging.
* Supports all SPM modes, including scanning capacitance, scanning thermal, scanning Kelvin, and more.
* Streamlined measurement process. EZ-Snap probe-tip exchange utilizes a pre-aligned kinematic chip mount to guarantee identical position of different probe tips without the use of tools or head removal.

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About Park Systems Corp.
Park Systems Corp. was founded as PSIA in 1997 by Dr. Sang-il Park, a co-founder of Park Scientific Instruments, one of the earliest manufacturers of AFM. After years of research and development in Korea, PSIA unveiled its next-generation AFM in 2002. The XE-100 Series went on to win several awards for innovation, including being selected as one of Korea’s Ten Best New Technologies of 2004.

This year, PSIA changed its name to Park Systems to reflect the company’s focus on total metrological solutions. Forty percent of its staff of 100 – a higher percentage than any of its competitors – are scientists and engineers. This daunting technical force is supported by corporate offices in Korea, Japan and the United States.

Park Systems now offers AFM and SPM (scanning probe microscopes) for both small- and large-sample measurement, Near-field Scanning Optical Microscopy (NSOM) and Raman Spectrometry. In addition, the company also offers an industrial product line that extends the innovative XE technology to a variety of metrological applications, including hard disk inspection, next-generation sliders, sidewall/overhang imaging and profiling, and semiconductors.

For more information, please click here

Contacts:
Park Systems Inc.
3040 Olcott St,
Santa Clara, CA 95054
Tel: +1-408-986-1110
Fax: +1-408-986-1199

Contact: John Janzer

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