Nanotechnology Now - Press Release: Obducat launches new lithography system

Home > Press > Obducat launches new lithography system

Abstract:
On 30 January 2007 the Swedish company Obducat will have a world launch of its new NIL based system

Obducat launches new lithography system

Copenhagen | Posted on January 28th, 2007

A new lithography system based on nano imprint lithography (NIL) moves Obducat into a new industrial commercialisation phase. On 30 January 2007 a High Volume Manufacturing machine will be launched at a press conference. The HVM machine is requested by industrial enterprises on the international market and can, for example, be used in mass production of electronic components.

####

About Nano Øresund
Nano Øresund aims at bringing together nanotechnology strengths in innovation, education, research and laboratory infrastructure on the Danish and Swedish sides of Øresund, to bring out the full potential of the region in this field. A primary objective is to provide the base for all aspects of nanotechnological co-operation in the region, where academia and industry participate, and also to communicate Øresund's capacity in these terms internationally.

The work is politically and financially supported by a number of public organisations. Half of the budget is provided by the European Regional Development Fund, and major part of the rest consists of funding from regional authorities on the Swedish and Danish sides of Øresund, that is, Region Skåne and Greater Copenhagen Authority (HUR). Internationally acknowledged academics from universities in the region with longstanding experience in nanoscience and nanotechnology also participate in the work.

For more information, please click here

Contacts:
Anna Ek at Obducat

+ 46 40 36 21 08 or
+ 46 703-27 37 08

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark: