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November 29th, 2004

Obducat´s Ken Mason on NIL and the US market

Abstract:
In the NanoImprint Lithography (NIL) process, a pattern is transferred from a mold (Stamper) into a thin Polymer film (resist). The process of imprinting may be facilitated by heat, pressure, or the application of Ultra-Violet light for the purpose of curing the resist layer. NIL has wide process latitude with its most critical process parameter being gas pressure uniformity.

Source:
Obducat

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