Home > News > IMEC claims silicide gate could enable 45-nm process
October 16th, 2004
IMEC claims silicide gate could enable 45-nm process
Abstract:
IMEC has demonstrated the integration of fully-silicided NiSi gates on top of high-k gate stacks, claiming a potential breakthrough that would enable development of a 45-nm manufacturing process.
Source:
eetimes
| Related Links |
| Related News Press |
Chip Technology
A reusable chip for particulate matter sensing April 17th, 2026
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
Announcements
A fundamentally new therapeutic approach to cystic fibrosis: Nanobody repairs cellular defect April 17th, 2026
UC Irvine physicists discover method to reverse ‘quantum scrambling’ : The work addresses the problem of information loss in quantum computing system April 17th, 2026
|
|
||
|
|
||
| The latest news from around the world, FREE | ||
|
|
||
|
|
||
| Premium Products | ||
|
|
||
|
Only the news you want to read!
Learn More |
||
|
|
||
|
Full-service, expert consulting
Learn More |
||
|
|
||