Home > News > IMEC AND KLA-Tencor Partner in Sub-65-nm Lithography
October 7th, 2004
IMEC AND KLA-Tencor Partner in Sub-65-nm Lithography
Abstract:
KLA-Tencor and IMEC, Europe's leading independent nanoelectronics and nanotechnology research center based in Belgium, today announced that they have entered into a joint-development project (JDP) to accelerate the adoption of optical critical dimension (CD) metrology technology for next-generation
(65-nm and below) semiconductor applications.
Source:
prnewswire
Bookmark:
| Related News Press |
Investments/IPO's/Splits
Daikin Industries becomes OCSiAl shareholder July 27th, 2021
INBRAIN Neuroelectronics raises over €14M to develop smart graphene-based neural implants for personalised therapies in brain disorders March 26th, 2021
180 Degree Capital Corp. Issues Second Open Letter to the Board and Shareholders of Enzo Biochem, Inc. March 26th, 2021
Chip Technology
New ocelot chip makes strides in quantum computing: Based on "cat qubits," the technology provides a new way to reduce quantum errors February 28th, 2025
Enhancing transverse thermoelectric conversion performance in magnetic materials with tilted structural design: A new approach to developing practical thermoelectric technologies December 13th, 2024
Bringing the power of tabletop precision lasers for quantum science to the chip scale December 13th, 2024
Tools
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025
Turning up the signal November 8th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||