Home > News > Researchers Develop Improved Method to Produce Nanometer-scale Patterns
August 30th, 2004
Researchers Develop Improved Method to Produce Nanometer-scale Patterns
Abstract:
Researchers from the Georgia Institute of Technology and the Naval Research Laboratory (NRL) have developed an improved method for directly writing nanometer-scale patterns onto a variety of surfaces.
Infrared microscope image shows a cantilever during heating. The colors correspond to temperature, the hottest reaching approximately 200 degrees Celsius. The microcantilevers are engineered such that the temperature increases only near the free end. The new writing method, dubbed “thermal dip pen nanolithography,” represents an important extension for dip pen nanolithography (DPN), an increasingly popular technique that uses atomic force microscopy (AFM) probes as pens to produce nanometer-scale patterns.
Source:
GTResearchnews
Bookmark:
| Related News Press |
Chip Technology
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
Beyond silicon: Electronics at the scale of a single molecule January 30th, 2026
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
Discoveries
From sensors to smart systems: the rise of AI-driven photonic noses January 30th, 2026
Decoding hydrogen‑bond network of electrolyte for cryogenic durable aqueous zinc‑ion batteries January 30th, 2026
COF scaffold membrane with gate‑lane nanostructure for efficient Li+/Mg2+ separation January 30th, 2026
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||