Home > News > Researchers Develop Improved Method to Produce Nanometer-scale Patterns
August 30th, 2004
Researchers Develop Improved Method to Produce Nanometer-scale Patterns
Abstract:
Researchers from the Georgia Institute of Technology and the Naval Research Laboratory (NRL) have developed an improved method for directly writing nanometer-scale patterns onto a variety of surfaces.
Infrared microscope image shows a cantilever during heating. The colors correspond to temperature, the hottest reaching approximately 200 degrees Celsius. The microcantilevers are engineered such that the temperature increases only near the free end. The new writing method, dubbed “thermal dip pen nanolithography,” represents an important extension for dip pen nanolithography (DPN), an increasingly popular technique that uses atomic force microscopy (AFM) probes as pens to produce nanometer-scale patterns.
Source:
GTResearchnews
Related News Press |
Chip Technology
New chip opens door to AI computing at light speed February 16th, 2024
HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024
NRL discovers two-dimensional waveguides February 16th, 2024
Discoveries
What heat can tell us about battery chemistry: using the Peltier effect to study lithium-ion cells March 8th, 2024
Researchers’ approach may protect quantum computers from attacks March 8th, 2024
High-tech 'paint' could spare patients repeated surgeries March 8th, 2024
Nanoscale CL thermometry with lanthanide-doped heavy-metal oxide in TEM March 8th, 2024
The latest news from around the world, FREE | ||
Premium Products | ||
Only the news you want to read!
Learn More |
||
Full-service, expert consulting
Learn More |
||