Home > News > Nanoimprint lithography gets smaller
July 28th, 2004
Nanoimprint lithography gets smaller
Abstract:
Researchers at Princeton University, US, have shown that photocurable nanoimprint lithography (P-NIL) can produce lines of polymer resist just 7 nm wide with a pitch (or pattern repeat) of only 14 nm. The technique also produced reliable results over the whole area of a 4 inch wafer. (more on earlier article)
Source:
Nanotechweb
Related News Press |
Chip Technology
New method cracked for high-capacity, secure quantum communication July 5th, 2024
Diamond glitter: A play of colors with artificial DNA crystals May 17th, 2024
Oscillating paramagnetic Meissner effect and Berezinskii-Kosterlitz-Thouless transition in cuprate superconductor May 17th, 2024
![]() |
||
![]() |
||
The latest news from around the world, FREE | ||
![]() |
![]() |
||
Premium Products | ||
![]() |
||
Only the news you want to read!
Learn More |
||
![]() |
||
Full-service, expert consulting
Learn More |
||
![]() |