Home > News > Lithography gear switches for 65 nm
July 12th, 2004
Lithography gear switches for 65 nm
Abstract:
With 157-nanometer optical lithography having "missed the window" for the upcoming 65-nm process node, International Sematech has all but slammed the door on the decade-long 157-nm development effort. The consortium said last week that it is opening an Immersion Technology Center (iTC) here to focus on 193-nm immersion lithography, with an eye toward possibly extending the technology to the 32-nm process node.
Source:
EETimes
Bookmark:
| Related News Press |
Chip Technology
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
Beyond silicon: Electronics at the scale of a single molecule January 30th, 2026
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
Tools
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
From sensors to smart systems: the rise of AI-driven photonic noses January 30th, 2026
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||