Home > News > Fluid scheme yields high-dielectric films
February 4th, 2004
Fluid scheme yields high-dielectric films
Abstract:
A fundamentally new approach to creating nanostructures by forming them with supercritical fluids could be used to make dielectric films used in semiconductor processes. The approach is being forged in a joint project between the University of Massachusetts Amherst and Novellus Systems Inc.
Source:
EETimes
Bookmark:
| Related News Press |
Discoveries
Chemical reactions can scramble quantum information as well as black holes April 5th, 2024
New micromaterial releases nanoparticles that selectively destroy cancer cells April 5th, 2024
Utilizing palladium for addressing contact issues of buried oxide thin film transistors April 5th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||