Home > News > Nikon launches EUV lithography development
January 15th, 2004
Nikon launches EUV lithography development
Abstract:
Nikon Corp. said Wednesday it will begin full-scale development of extreme ultraviolet lithography systems in 2004 and will begin offering working tools by 2006. Nikon had already announced an aggressive development plan for 193-nm ArF immersion lithography, with shipments planned as early as 2005. Nikon intends to offer an ArF dry tool with high NA of 0.9, then an ArF immersion tool for the 45-nm node and, finally, EUV for 45-nm manufacturing and beyond.
Source:
EETimes
Bookmark:
| Related News Press |
Chip Technology
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
Beyond silicon: Electronics at the scale of a single molecule January 30th, 2026
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
Tools
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
From sensors to smart systems: the rise of AI-driven photonic noses January 30th, 2026
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||