Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Asahi Kasei Orders IQ Aligner UV-NIL System From EV Group for Advanced Materials Development for High-Resolution Wafer-Level Optics: System to Include EVG's Monolithic Lens Molding (MLM) Technology to Support Production of More Compact, Higher-quality Lens Stacks

Abstract:
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Asahi Kasei E-Materials Corporation, the core operating company of the Asahi Kasei Group for electronics materials, energy materials, photosensitive materials and epoxy resins, has purchased an IQ Aligner UV nanoimprint lithography (UV-NIL) system from EVG. The IQ Aligner, a flexible platform designed to enable multiple steps in the manufacture of wafer-level cameras, will be used by Asahi Kasei to develop materials critical for enabling high-resolution wafer-level optics (which are used in a wide variety of applications, such as smart phones and pico projectors).

Asahi Kasei Orders IQ Aligner UV-NIL System From EV Group for Advanced Materials Development for High-Resolution Wafer-Level Optics: System to Include EVG's Monolithic Lens Molding (MLM) Technology to Support Production of More Compact, Higher-quality Lens Stacks

Chiba City, Japan | Posted on December 7th, 2011

"As a leading provider of high-clarity, high-heat-resistant materials for optical and display components used in mobile electronics equipment, Asahi Kasei places great importance on research and development of new materials to better serve the rapidly growing mobile device market," stated Mr. Shoichi Furukawa, General Manager, Electronics Materials Division, for Asahi Kasei. "We purchased EVG's IQ Aligner to support our research and development efforts because it is the de-facto industry standard for UV-NIL, which is a critical enabler of wafer-level optics. We anticipate that the IQ Aligner, and the close cooperation with EVG's process teams, will significantly contribute to our development of new and unique materials that will help enable our customers' next-generation products."

In wafer-level camera production, glass substrates are typically used as carrier and spacer wafers for the lenses, which are composed of an optical polymer material. The different material characteristics of these components limit resolution and picture quality, which hinder the scalability and quality of the camera modules. EVG's Monolithic Lens Molding (MLM) process—an option available on its IQ Aligner system—overcomes this limitation by eliminating the need for glass substrates. Instead, the polymer is molded between two stamps and then cured with UV exposure by EVG's IQ Aligner system. By omitting the glass substrates, wafer-level optics manufacturers face fewer constraints on the optic and lens stack design—enabling the production of thinner lens wafers and significantly shorter optical stacks. In addition, since the IQ Aligner molds the micro-lenses using a room-temperature UV-NIL process versus thermal imprinting, a high degree of precision alignment is achieved between the various elements in the optical lens stack—maximizing device performance.

"As the market for mobile devices continues to evolve rapidly, new solutions are needed to support the production of increasingly sophisticated wafer-level optics that are being integrated into these consumer products," stated Paul Lindner, executive technology director, EVG. "Asahi Kasei is a recognized leader in advancing materials and chemistry technology, and we are pleased that they have selected our IQ Aligner system to develop the next generation of materials that will be integrated into the advanced optical lens stacks and help fuel the growth of the wafer-level camera market."

####

About EV Group (EVG)
EV Group (EVG) is a world leader in wafer-processing solutions for semiconductor, MEMS and nanotechnology applications. Through close collaboration with its global customers, the company implements its flexible manufacturing model to develop reliable, high-quality, low-cost-of-ownership systems that are easily integrated into customers' fab lines. Key products include wafer bonding, lithography/nanoimprint lithography (NIL) and metrology equipment, as well as photoresist coaters, cleaners and inspection systems.

In addition to its dominant share of the market for wafer bonders, EVG holds a leading position in NIL and lithography for advanced packaging and MEMS. Along these lines, the company co-founded the EMC-3D consortium in 2006 to create and help drive implementation of a cost-effective through-silicon via (TSV) process for major ICs and MEMS/sensors. Other target semiconductor-related markets include silicon-on-insulator (SOI), compound semiconductor and silicon-based power-device solutions.

Founded in 1980, EVG is headquartered in St. Florian, Austria, and operates via a global customer support network, with subsidiaries in Tempe, Ariz.; Albany, N.Y.; Yokohama and Fukuoka, Japan; Seoul, Korea and Chung-Li, Taiwan.

About Asahi Kasei E-materials

Asahi Kasei E-materials is the core operating company of the Asahi Kasei Group, established in April 2009 to consolidate businesses for electronics materials, energy materials, photosensitive materials, and epoxy resins to create better value for customers through synergy of product and service.

Asahi Kasei E-materials holds dominant market share for materials such as photo sensitive polyimide "Pimel™", ultra thin glass fablic, epoxy latent curing agent "Novacure™", photosensitive dry film resist "Sunfort™", photo mask anti dust film "Pellicles™" and separator membrane for lithium-ion rechargeable batteries "Hipore™".

Asahi Kasei E-materials' R&D system enables speedy development of unique and advanced electronics materials through close attention to customer voice and collaboration with key market players.

For more information, please click here

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Searching for errors in the quantum world September 21st, 2018

Viral RNA sensing: Optical detection of picomolar concentrations of RNA using switches in plasmonic chirality September 21st, 2018

UT engineers develop first method for controlling nanomotors: Breakthrough for nanotechnology as UT engineers develop first method for switching the mechanical motion of nanomotors September 21st, 2018

Nanobiotix: Update on Head and Neck Phase I/II Trial with NBTXR3 and Other program data presented at ImmunoRad 2018 September 20th, 2018

MEMS

Mirrorcle Demonstrates MEMS-based Programmable Light Source at CES and PW18 August 30th, 2018

Stress-free ALD from Picosun August 28th, 2018

Nano-kirigami: 'Paper-cut' provides model for 3D intelligent nanofabrication July 13th, 2018

Cleaning or Etching Items with Unique Geometries Requires Specialized Expertise June 27th, 2018

Chip Technology

Researchers managed to prevent the disappearing of quantum information September 14th, 2018

New devices based on rust could reduce excess heat in computers: Physicists explore long-distance information transmission in antiferromagnetic iron oxide September 14th, 2018

New photonic chip promises more robust quantum computers September 14th, 2018

How a tetrahedral substance can be more symmetrical than a spherical atom: A new type of symmetry September 14th, 2018

Announcements

Searching for errors in the quantum world September 21st, 2018

Viral RNA sensing: Optical detection of picomolar concentrations of RNA using switches in plasmonic chirality September 21st, 2018

UT engineers develop first method for controlling nanomotors: Breakthrough for nanotechnology as UT engineers develop first method for switching the mechanical motion of nanomotors September 21st, 2018

Nanobiotix: Update on Head and Neck Phase I/II Trial with NBTXR3 and Other program data presented at ImmunoRad 2018 September 20th, 2018

Tools

Carbon nanodots do an ultrafine job with in vitro lung tissue: New experiments highlight the role of charge and size when it comes to carbon nanodots that mimic the effect of nanoscale pollution particles on the human lung. September 12th, 2018

Terahertz spectroscopy enters the single-molecule regime September 7th, 2018

Mirrorcle Demonstrates MEMS-based Programmable Light Source at CES and PW18 August 30th, 2018

Stress-free ALD from Picosun August 28th, 2018

Events/Classes

Nanobiotix: Update on Head and Neck Phase I/II Trial with NBTXR3 and Other program data presented at ImmunoRad 2018 September 20th, 2018

Arrowhead Pharmaceuticals to Present at Upcoming September 2018 Conferences August 31st, 2018

Stress-free ALD from Picosun August 28th, 2018

Kavli Lectures: New vision of nanomaterial synthesis and light-fueled space travel August 8th, 2018

New-Contracts/Sales/Customers

Nanometrics Delivers 100th: Atlas III System for Advanced Process Control Metrology Atlas III: Systems are qualified and in production for advanced devices in DRAM, 3D-NAND and Foundry/Logic August 2nd, 2018

Picosun’s ALD solutions make quality watches tick July 26th, 2018

Barium ruthenate: A high-yield, easy-to-handle perovskite catalyst for the oxidation of sulfides July 13th, 2018

Oxford Instruments’ 22 Tesla superconducting magnet system commissioned at the UAM, making it the most intense magnetic field available outside a large international facility July 12th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project