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Cambridge NanoTech, at the cutting-edge of nanotechnology development, today announced the delivery of its 40th Fiji™ Plasma Atomic Layer Deposition (ALD) system. ALD is being used to enable high impact technologies, such as microelectronics, lighting and display, and energy storage.
As the leading ALD supplier to academic and industrial institutions worldwide, Cambridge NanoTech continually seeks new ways to advance ALD research and industrialization. The company introduced the Fiji system in 2009, delivering unparalleled flexibility and ease of experimental use. The system's process versatility, advanced functionality, and compact footprint has made it the most sought after Plasma ALD tool for researchers and technologists who are looking to produce ultra-thin coatings that are highly precise, digitally controlled, pin-hole free, and perfectly dense.
Cambridge NanoTech has garnered a wealth of experience in the plasma ALD realm by conducting internal research and solving customers' research challenges. The company's scientists have developed plasma ALD processes for a variety of oxides, nitrides, and metals, including titanium nitride, platinum, and other materials. The resulting plasma recipes allow for low resistivity of titanium nitride, and significantly lower temperatures for depositing platinum.
Cambridge NanoTech has created a highly collaborative research environment, enabling customers to have unprecedented access to this wealth of experience and advice from the company's highly-skilled and renowned scientific team. Whether a customer is looking to develop a new ALD process, overcome a research obstacle, or commercialize discoveries in the lab, Cambridge NanoTech scientists are on hand to guide them.
"For research being conducted at the Université catholique de Louvain (UCL), we were looking for high-k conformal thin films deposited at room temperature. Cambridge NanoTech has come to us with a complete solution, integrating many features in a state-of-art tool allowing us a broad range of material selection," said Laurent Francis, PhD., Microsystems Chair for UCL. "As we were not acquainted with ALD technology, Cambridge NanoTech offered excellent support with both the ALD technique and the Fiji F200 tool that we installed at UCL. The on-site installation of the equipment was performed adeptly by Cambridge NanoTech's technical team. For an academic institution such as ours, Cambridge NanoTech provided us with a solution suited to a broad range of research purposes. The competence of Cambridge NanoTech in ALD systems is undoubtedly a great asset."
"The Fiji ALD system combines ease of use with a remarkable set of functionality that allows researchers to deposit materials under varying conditions, including high and low temperatures," said Jill S. Becker, PhD., President and Founder of Cambridge NanoTech. "Our customers also appreciate the system's add-on features, such as the Wafer Plus module for larger samples, the Cluster module for automation integration, and the High Temperature module for processing samples up to 800°C."
About Cambridge NanoTech
Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra-thin films that are used in a wide variety of research and industrial applications. Our manufacturing ALD systems are used in the production of semiconductors, flat panel displays, and solid state lighting. Cambridge NanoTech research systems are used by world class scientists on five continents to study superior ALD film properties such as electrical, anti-bacterial, UV-blocking, and anti-reflection.
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