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Princeton NJ, Jan. 31. 2010: Nanonex Corp., the world's pioneer and leader in nanoimprint lithography (NIL) tools and solutions announced the opening of a new, advanced class 100 cleanroom to meet the growing demand for Nanonex products and services. The new cleanroom will enable Nanonex to enlarge its manufacturing capability, expand its R&D efforts, and strengthen its leading position as the first choice for nanoimprint tools and solutions since 1999.
The expansion plan is the result of a growing backlog of equipment orders and a bright outlook for Nanonex products and services going forward.
Nanonex is the inventor of NIL, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary NIL solutions and Air-Cushion PressTM can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials. Nanonex has over 100 customers and an installed base of over 50 tools world-wide.
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