Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

android tablet pc

Home > Press > FEI Company Joins SEMATECH on Metrology Research at UAlbany NanoCollege

Collaboration to address inline elemental analysis of defects for the 45nm node and beyond

FEI Company Joins SEMATECH on Metrology Research at UAlbany NanoCollege

Albany, NY and Hillsboro, OR | Posted on July 14th, 2009

FEI Company, (NASDAQ: FEIC), a leading provider of atomic-scale imaging and analysis systems, and
SEMATECH, the global consortium of chipmakers, announced today that FEI Company has joined SEMATECH's Advanced Metrology Development Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. The collaboration will expand on current joint efforts for the development of novel technologies to enable improved process control and yield.

As a member of this program, FEI will collaborate with experts in SEMATECH's Metrology divisions to develop high-resolution capabilities of transmission electron microscopy (TEM) analysis, with electron energy loss spectroscopy (EELS) and focused ion beam (FIB) technology to address critical needs in process development and defect analysis. These tools will provide the high resolution imaging and compositional data on the scale of a few nanometers, which is invaluable for defect analysis.

"The Advanced Development Metrology Program is a prime example of SEMATECH's collaborative model in which leading equipment and materials manufacturers can participate in a broader consortium-university-industry partnership to develop cutting-edge metrology and characterization techniques," said John Warlaumont, SEMATECH vice president of technology. "The collaborative effort among world-class researchers and engineers from FEI, SEMATECH and CNSE, along with access to critical laboratory analytical equipment available within CNSE, form an important cornerstone in providing world-leading advanced metrology capabilities to our members."

"FEI is proud to supply SEMATECH with our highly advanced wafer-to-TEM data equipment suite, which will help them maximize the volume of high resolution imaging and analytical data output for next generation semiconductor devices," said Rudy Kellner, vice president & general manager of FEI's
Electronics Division. "Utilizing the automated, high-throughput CLM+™ TEM sample preparation solution, combined with FEI's TEMLink lamella lift out system, SEMATECH will be able to produce a steady supply of high quality TEM lamella for its Titan TEM. Equipped with the new MultiLoader double-tilt sample holder, the Titan TEM achieves a level of unprecedented connectivity across system platforms enabling secure, reliable, and traceable sample transfer."

Analytical TEM has historically been used for basic research in advanced materials development. However, as electronic devices approach the nanometer scale, defects consisting of even a few atoms become critical. The combination of both TEM and EELS is uniquely powerful in that it provides detailed information about physical structure, atomic arrangement, chemical
bonding, density, and electronic behavior on a nanometer scale. The result is a much more complete profile of each material than would have been possible with a smaller set of techniques.

"The integration of FEI's TEM with EELS is a leading candidate to replace SEM- based EDX for inline elemental analysis of defects for the 45nm node and below," said Brad Thiel, CNSE Associate Professor of Nanoscience and Director of SEMATECH's Advanced Metrology Development Program at the UAlbany NanoCollege. "We welcome FEI's membership, and look forward to their participation as we work together to drive the development of processes, materials, and characterization technologies that are critical for continued progress and leadership in nanoscale manufacturing."

"We are pleased to welcome FEI to the growing roster of industry-leading companies engaged in cutting-edge nanoelectronics research and development at the UAlbany NanoCollege," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "This collaborative relationship with FEI further demonstrates the success of the SEMATECH-CNSE partnership in accelerating nanoscale innovations, supporting pioneering education, and fostering high-tech economic growth, all of which underscore New York's recognition as a global leader in nanotechnology."

Integration of new materials into semiconductor devices requires advanced analytical characterization techniques such as the high-resolution imaging capabilities afforded by TEM. FIB technology is uniquely suited for preparing ultrathin TEM samples from even the smallest device features.

SEMATECH's Advanced Metrology Development Program at the UAlbany NanoCollege is assessing and developing new characterization technologies that will address current and projected metrology gaps. "Our goal is to develop characterization techniques and methodologies to address a range of issues, including the metrology for films, defects, and 3D structures," said Thiel.


For over 20 years, SEMATECH® ( has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About FEI

FEI (Nasdaq: FEIC) is a leading diversified scientific instruments company. It is a premier provider of electron and ion-beam microscopes and tools for nanoscale applications across many industries: industrial and academic materials research, life sciences, semiconductors, data storage, natural resources and more. With a 60-year history of technological innovation and leadership, FEI has set the performance standard in transmission electron microscopes (TEM), scanning electron microscopes (SEM) and DualBeams™, which combine a SEM with a focused ion beam (FIB). FEI’s imaging systems provide 3D characterization, analysis and modification/prototyping with resolutions down to the sub-Ångström (one-tenth of a nanometer) level. FEI’s NanoPorts in North America, Europe and Asia provide centers of technical excellence where its world-class community of customers and specialists collaborate. FEI has approximately 1800 employees and sales and service operations in more than 50 countries around the world.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Vistec Lithography and Atotech. For more information, visit

For more information, please click here

SEMATECH Media Contact:

Erica McGill

CNSE Media Contact
Steve Janack

FEI Contacts
Sandy Fewkes, Principal (media)
MindWrite Communications, Inc
+1 408 224 4024

FEI Company
Fletcher Chamberlin (investors and analysts)
Investor Relations
+1 503 726 7710

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Ultrasonic Waves Applied in Production of Graphene Nanosheets August 20th, 2014

The channel that relaxes DNA: Relaxing DNA strands by using nano-channels: Instructions for use August 20th, 2014

Success in Intracellular Imaging of Cesium Distribution in Plants Used for Cesium Absorption August 19th, 2014

Chip Technology

Electrical engineers take major step toward photonic circuits: Team invents non-metallic metamaterial that enables them to 'compress' and contain light August 19th, 2014

Promising Ferroelectric Materials Suffer From Unexpected Electric Polarizations: Brookhaven Lab scientists find surprising locked charge polarizations that impede performance in next-gen materials that could otherwise revolutionize data-driven devices August 18th, 2014

AI Technology (AIT) Introduces Novel High Temperature Large Area Underfill with Proven Stress Absorption August 15th, 2014

Iranian Scientists Stabilize Protein on Highly Stable Electrode Surface August 14th, 2014


A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

3-D nanostructure could benefit nanoelectronics, gas storage: Rice U. researchers predict functional advantages of 3-D boron nitride July 15th, 2014

IBM Announces $3 Billion Research Initiative to Tackle Chip Grand Challenges for Cloud and Big Data Systems: Scientists and engineers to push limits of silicon technology to 7 nanometers and below and create post-silicon future July 10th, 2014


Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Ultrasonic Waves Applied in Production of Graphene Nanosheets August 20th, 2014

The channel that relaxes DNA: Relaxing DNA strands by using nano-channels: Instructions for use August 20th, 2014

Electrical engineers take major step toward photonic circuits: Team invents non-metallic metamaterial that enables them to 'compress' and contain light August 19th, 2014


Oxford Instruments Asylum Research Receives the 2014 Microscopy Today Innovation Award for blueDrive Photothermal Excitation August 18th, 2014

Laser makes microscopes way cooler: Cooling a nanowire probe with a laser could lead to substantial improvements in the sensitivity of atomic force probe microscopes August 15th, 2014

JPK reports on the use of AFM and advanced fluorescence microscopy at the University of Freiburg August 13th, 2014

Phasefocus reports on the use of their high-precision Lens Profiler for measuring contact lens thickness at the Brien Holden Vision Institute in Sydney, Australia August 13th, 2014


SouthWest NanoTechnologies Appoints Matteson-Ridolfi for U.S. Distribution of its SMW™ Specialty Multiwall Carbon Nanotubes August 13th, 2014

Could hemp nanosheets topple graphene for making the ideal supercapacitor? August 12th, 2014

On the frontiers of cyborg science August 10th, 2014

Like cling wrap, new biomaterial can coat tricky burn wounds and block out infection August 10th, 2014

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project

© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE