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Home > News > Carving New Frontiers for Ion-Beam Technology

November 1st, 2004

Carving New Frontiers for Ion-Beam Technology

Abstract:
An ion-beam system that simultaneously combines focused beams of electrons and positive ions promises to improve the versatility, efficiency, and economy of this important technology.

Focused ion beams are important in the semiconductor industry, where they are used to carve structures with dimensions measured in billionths of a meter, repair defects in masks used for photolithography, isolate and analyze elements of integrated circuits, "dope" semiconductors with specific atomic species, and perform other tasks.

Source:
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