Home > News > JMAR Granted X-Ray Lithography Patent
March 2nd, 2005
JMAR Granted X-Ray Lithography Patent
Abstract:
JMAR Technologies, Inc. has been issued a patent for advanced X-ray lithography stepper technology that will enable a faster, more cost-effective means of producing state-of-the-art zone plate optics for its Compact X-ray Microscope and X-ray Nano Probe product lines.
Source:
businesswire
Related News Press |
Announcements
NRL charters Navy’s quantum inertial navigation path to reduce drift April 5th, 2024
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Tools
Ferroelectrically modulate the Fermi level of graphene oxide to enhance SERS response November 3rd, 2023
The USTC realizes In situ electron paramagnetic resonance spectroscopy using single nanodiamond sensors November 3rd, 2023
Patents/IP/Tech Transfer/Licensing
Getting drugs across the blood-brain barrier using nanoparticles March 3rd, 2023
Metasurfaces control polarized light at will: New research unlocks the hidden potential of metasurfaces August 13th, 2021
Arrowhead Pharmaceuticals Announces Closing of Agreement with Takeda November 27th, 2020
The latest news from around the world, FREE | ||
Premium Products | ||
Only the news you want to read!
Learn More |
||
Full-service, expert consulting
Learn More |
||