Home > News > EV Group Unveils NanoAlign Technology
July 8th, 2004
EV Group Unveils NanoAlign Technology
Abstract:
EV Group, a leading supplier of wafer-bonding and lithography equipment, today announced that it has developed an advanced aligner technology that improves competitiveness of full-field lithography by providing the industry's highest alignment accuracy and resolution at lowest cost of ownership. The new NanoAlign Technology features active run-out control and sub-100nm dynamic alignment resolution, complemented by UV-Nanoimprint (UV-NIL) capability.
Source:
TMCnet
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