Home > News > Ultratech Introduces the LSA100 Laser Spike Anneal System
June 15th, 2004
Ultratech Introduces the LSA100 Laser Spike Anneal System
Abstract:
Ultratech, Inc. today introduced the LSA100 laser spike anneal system -- the first tool built on the company's new Unity Platform(TM), announced earlier today. Featuring the patented laser-processing (LP) technology Ultratech unveiled last year, the LSA100 represents one of the industry's first commercially available laser-processing systems for both development and volume production of 65nm and
smaller devices.
Source:
PRNewswire
| Related News Press |
Announcements
Decoding hydrogen‑bond network of electrolyte for cryogenic durable aqueous zinc‑ion batteries January 30th, 2026
COF scaffold membrane with gate‑lane nanostructure for efficient Li+/Mg2+ separation January 30th, 2026
Tools
Metasurfaces smooth light to boost magnetic sensing precision January 30th, 2026
From sensors to smart systems: the rise of AI-driven photonic noses January 30th, 2026
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
|
|
||
|
|
||
| The latest news from around the world, FREE | ||
|
|
||
|
|
||
| Premium Products | ||
|
|
||
|
Only the news you want to read!
Learn More |
||
|
|
||
|
Full-service, expert consulting
Learn More |
||
|
|
||