Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Letiís IDEAL and IMAGINE Programs Demonstrate Cost-effective Solutions to Extend 193nm Immersion Lithography for 1X Nodes

Abstract:
CEA-Leti said today that its multi-partner programs, IDEAL and IMAGINE, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X nodes for critical levels such as contact and via, and for the cut layer, when multi-patterning is used.

Letiís IDEAL and IMAGINE Programs Demonstrate Cost-effective Solutions to Extend 193nm Immersion Lithography for 1X Nodes

Grenoble, France | Posted on July 9th, 2013

Leti and Arkema launched the IDEAL program in 2011 to develop lithography techniques based on nanostructured polymers, using 300mm directed self-assembly (DSA) process and material solutions for 1X nodes. The partners, which include Sokudo, Tokyo Electron, STMicroelectronics and advanced academic laboratories, such as LTM and LCPO, have demonstrated DSA resolution capability down to sub-10nm half-pitch.

"IDEAL is addressing the limits of conventional optical lithography with a technological solution that offers potential cost-reduction opportunities," said Serge Tedesco, Leti's lithography program manager. Self-assembly lithography with block copolymer is a highly promising complementary technology due to its low manufacturing costs and its straightforward integration in existing device-manufacturing processes."

The collaboration also recently completed DSA process integration in Leti's 300mm pilot line and new specific modules have been implemented in the 300mm Sokudo DUO Track for coating, baking and PMMA removal, one of the key steps in DSA process implementation.

IMAGINE, a multiple electron-beam-lithography R&D program with a dozen partners, is focused on developing maskless lithography (ML2) based on MAPPER Lithography tools for high throughput.

The IMAGINE program this year will interface a 1,300-electron-beam tool (Matrix platform) with the Sokudo 300mm DUO Track, targeting a throughput of one wafer per hour. That will be followed by a 13,000-beam system producing a throughput of 10 wafers per hour in early 2015. The longer-term goal is a cluster of 10 modules allowing a throughput of 100 wph to support 1Xnm logic-nodes production.

Launched as a three-year project in 2009, IMAGINE was extended for four years in 2012. Besides Leti and MAPPER, the program also includes TSMC, STMicroelectronics, Nissan Chemical, TOK, Dow, JSR Micro, Sokudo, TEL, Mentor Graphics and Aselta Nanographics.

"These concrete results clearly show the industry that DSA and ML2 can extend 193nm immersion lithography by providing cost-effective solutions for critical-layer patterning," Tedesco said. "They also demonstrate the value of combining the broad and deep technological strengths of Leti, MAPPER, Arkema, and all our partners in programs focused on meeting the demands at 1X nodes."

####

About CEA-Leti
Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-m≤ of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,700 scientists and engineers including 320 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 2,200 patent families.

For more information, please click here

Contacts:
CEA-Leti
+33 4 38 78 02 26


Agency
+33 6 64 52 81 10

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Why Is Google Making Synthetic Arms? February 1st, 2015

Nanomaterials Used to Reduce Heat Generated by LED Panels February 1st, 2015

Leader Describes Iran's Independence as Root Cause of Bullying Powers' Enmity February 1st, 2015

Performance Drop in Solar Cells Prevented by Nanotechnology February 1st, 2015

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Researchers Make Magnetic Graphene: UC Riverside research could lead to new multi-functional electronic devices January 27th, 2015

New pathway to valleytronics January 27th, 2015

Nanoelectronics

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Discoveries

Nanomaterials Used to Reduce Heat Generated by LED Panels February 1st, 2015

Performance Drop in Solar Cells Prevented by Nanotechnology February 1st, 2015

Pinholes are Pitfalls for High Performance Solar Cells February 1st, 2015

New method allows for greater variation in band gap tunability: The method can change a material's electronic band gap by up to 200 percent January 31st, 2015

Announcements

Why Is Google Making Synthetic Arms? February 1st, 2015

Nanomaterials Used to Reduce Heat Generated by LED Panels February 1st, 2015

Leader Describes Iran's Independence as Root Cause of Bullying Powers' Enmity February 1st, 2015

Performance Drop in Solar Cells Prevented by Nanotechnology February 1st, 2015

Alliances/Partnerships/Distributorships

The Original Frameless Shower Doors Installs DFI's FuseCubeô to Offer Hydrophobic Protective Coating as a Standard Feature: First DFI FuseCubeô Installed on the East Coast to Enable Key Differentiator for the Original Frameless Shower Doors January 29th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Smart keyboard cleans and powers itself -- and can tell who you are January 21st, 2015

DNA 'glue' could someday be used to build tissues, organs January 14th, 2015

Printing/Lithography/Inkjet/Inks

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

Teijin to Participate in Nano Tech 2015 January 22nd, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Nanoshaping method points to future manufacturing technology December 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE