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Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced metrology systems, today announced that an emerging Asian foundry has selected Atlas XP+ optical critical dimension (OCD) metrology systems for process control of advanced logic devices. The Atlas XP+ platform was chosen over competitive solutions after a comprehensive head-to-head evaluation of technical performance on advanced devices. Nanometrics' global applications and customer support capabilities also played a key role in the decision process.
This selection represents long-term incremental business to Nanometrics, as the systems are to be deployed at multiple fabs worldwide to monitor the production of integrated circuits (ICs) with design features at the 3x and 2x technology nodes.
"As logic manufacturers drive to smaller technology nodes, the combination of new device structures and exotic materials such as 3D structures and high-K metal gates challenge the limits of process control," said David Doyle, vice president of Nanometrics' Semiconductor Business Unit. "Nanometrics' OCD technology is a proven solution to this challenge and has become a key enabler for device yield and lower manufacturing costs."
"This win further demonstrates the leadership role Nanometrics' products play in enabling the development and manufacturing of the most advanced and challenging semiconductor devices," said Dr. Timothy J. Stultz, president and chief executive officer. "We are committed to providing leading-edge technology along with global applications and customer support as we partner with our customers to help them address their business and technology challenges."
About Nanometrics Incorporated
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Select Global Market under the symbol NANO.
Forward Looking Statements
This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of the company’s metrology products, market leadership and growth. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, expectations regarding product capabilities, market share and growth are subject to a number of risks, including changes in customer spending plans and technology roadmaps, worldwide economic conditions and the continued technological leadership of our products. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended January 1, 2011 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.
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