Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Abstract:
Joint effort by longtime partners to develop resists for EUVL processing

TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on February 24th, 2010

Tokyo Electron Limited (TEL) and SEMATECH today announced that TEL has joined SEMATECH's Lithography Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

The TEL team will work alongside SEMATECH engineers at CNSE's Albany NanoTech Complex to advance extreme ultraviolet lithography (EUVL) and related infrastructure - including mask defect reduction, mask metrology, source, resist processing, etch, and overall manufacturability and extensibility of the technology.

As the industry prepares to start EUVL pilot line operations within a year, the remaining challenges in EUV resist processing must be addressed, including linewidth roughness (LWR) reduction, LWR uniformity across wafers, partitioning LWR reduction between resist processing and etch, as well as pattern collapse. TEL and SEMATECH are uniquely positioned to cooperate in those areas and to lead the industry in enabling pilot line-ready resist processing.

"We are excited by this opportunity to join TEL's engineering expertise with SEMATECH's R&D capabilities and know-how to develop leading-edge EUV lithography capability for our semiconductor customers," said Masayuki Tomoyasu, Senior Vice President of TEL Technology Center, America, LLC. "We look forward to working with SEMATECH to meet the technical and economic requirements of EUV technology and move the industry forward."

"We are building on our longstanding relationship with TEL, which is also participating in our Front End Processes and 3D Interconnect programs," said John Warlaumont, vice president of advanced technology at SEMATECH. "We're pleased to join forces in our lithography program as well, as we work together with TEL to advance EUVL technology and accelerate its progress to high-volume manufacturing."

"We are delighted to welcome this new alliance between SEMATECH and TEL, both of which are among the global technology leaders engaged in next-generation nanoelectronics research and development at the UAlbany NanoCollege," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "This new collaboration will enable advanced research for EUV lithography to support the critical needs of industry, while further demonstrating the success of the SEMATECH-CNSE partnership in accelerating leading-edge technologies."

Through global leadership and collaboration, SEMATECH's Lithography Program aims to drive consensus-based solutions and infrastructure development to ensure that capable, cost-effective lithography is available when needed to member companies and the semiconductor industry.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About TEL

TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange. www.tel.com

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Anne Englander
512-356-7155


Tokyo Electron Media Contact:
Michelle Pesez
512-424-1757


CNSE Media Contact:
Steve Janack
518-956-7322

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Untangling DNA: Researchers filter the entropy out of nanopore measurements December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Academic/Education

Luleå University of Technology is using the Deben CT5000TEC stage to perform x-ray microtomography experiments with the ZEISS Xradia 510 Versa to understand deformation and strain inside inhomogeneous materials November 7th, 2017

Park Systems Announces the Grand Opening of the Park NanoScience Center at SUNY Polytechnic Institute November 3rd, 2017

Two Scientists Receive Grants to Develop New Materials: Chad Mirkin and Monica Olvera de la Cruz recognized by Sherman Fairchild Foundation August 16th, 2017

Moving at the Speed of Light: University of Arizona selected for high-impact, industrial demonstration of new integrated photonic cryogenic datalink for focal plane arrays: Program is major milestone for AIM Photonics August 10th, 2017

Chip Technology

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Leti Integrates Hybrid III-V Silicon Lasers on 200mm Wafers with Standard CMOS Process December 6th, 2017

Leti Breakthroughs Point Way to Significant Improvements in SoC Memories December 6th, 2017

Nanoelectronics

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

Leti Will Present 11 Papers and Host More-than-Moore Technologies Workshop November 14th, 2017

The next generation of power electronics? Gallium nitride doped with beryllium: How to cut down energy loss in power electronics? The right kind of doping November 9th, 2017

Researchers bring optical communication onto silicon chips: Ultrathin films of a semiconductor that emits and detects light can be stacked on top of silicon wafers October 23rd, 2017

Announcements

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Untangling DNA: Researchers filter the entropy out of nanopore measurements December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Alliances/Trade associations/Partnerships/Distributorships

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Nano Global, Arm Collaborate on Artificial Intelligence Chip to Drive Health Revolution by Capturing and Analyzing Molecular Data in Real Time November 21st, 2017

EC Project Aims at Creating and Commercializing Cyber-Physical-System Solutions November 14th, 2017

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project