Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Abstract:
Joint effort by longtime partners to develop resists for EUVL processing

TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on February 24th, 2010

Tokyo Electron Limited (TEL) and SEMATECH today announced that TEL has joined SEMATECH's Lithography Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

The TEL team will work alongside SEMATECH engineers at CNSE's Albany NanoTech Complex to advance extreme ultraviolet lithography (EUVL) and related infrastructure - including mask defect reduction, mask metrology, source, resist processing, etch, and overall manufacturability and extensibility of the technology.

As the industry prepares to start EUVL pilot line operations within a year, the remaining challenges in EUV resist processing must be addressed, including linewidth roughness (LWR) reduction, LWR uniformity across wafers, partitioning LWR reduction between resist processing and etch, as well as pattern collapse. TEL and SEMATECH are uniquely positioned to cooperate in those areas and to lead the industry in enabling pilot line-ready resist processing.

"We are excited by this opportunity to join TEL's engineering expertise with SEMATECH's R&D capabilities and know-how to develop leading-edge EUV lithography capability for our semiconductor customers," said Masayuki Tomoyasu, Senior Vice President of TEL Technology Center, America, LLC. "We look forward to working with SEMATECH to meet the technical and economic requirements of EUV technology and move the industry forward."

"We are building on our longstanding relationship with TEL, which is also participating in our Front End Processes and 3D Interconnect programs," said John Warlaumont, vice president of advanced technology at SEMATECH. "We're pleased to join forces in our lithography program as well, as we work together with TEL to advance EUVL technology and accelerate its progress to high-volume manufacturing."

"We are delighted to welcome this new alliance between SEMATECH and TEL, both of which are among the global technology leaders engaged in next-generation nanoelectronics research and development at the UAlbany NanoCollege," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "This new collaboration will enable advanced research for EUV lithography to support the critical needs of industry, while further demonstrating the success of the SEMATECH-CNSE partnership in accelerating leading-edge technologies."

Through global leadership and collaboration, SEMATECH's Lithography Program aims to drive consensus-based solutions and infrastructure development to ensure that capable, cost-effective lithography is available when needed to member companies and the semiconductor industry.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About TEL

TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange. www.tel.com

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Anne Englander
512-356-7155


Tokyo Electron Media Contact:
Michelle Pesez
512-424-1757


CNSE Media Contact:
Steve Janack
518-956-7322

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Gold standards for nanoparticles: Understanding how small organic ions stabilize gold nanoparticles may allow for better control March 29th, 2017

Tiny sensor lays groundwork for precision X-rays detection via endoscopy:Nanoscale fiber-integrated X-ray sensor opens new doors for medical imaging and radiotherapy March 29th, 2017

Researchers uncover secret of nanomaterial that makes harvesting sunlight easier March 29th, 2017

Information storage with a nanoscale twist: Discovery of a novel rotational force inside magnetic vortices makes it easier to design ultrahigh capacity disk drives March 28th, 2017

Academic/Education

AIM Photonics Welcomes Coventor as Newest Member: US-Backed Initiative Taps Process Modeling Specialist to Enable Manufacturing of High-Yield, High-Performance Integrated Photonic Designs March 16th, 2017

Nominations Invited for $250,000 Kabiller Prize in Nanoscience: Major international prize recognizes a visionary nanotechnology researcher February 20th, 2017

Oxford Nanoimaging report on how the Nanoimager, a desktop microscope delivering single molecule, super-resolution performance, is being applied at the MRC Centre for Molecular Bacteriology & Infection November 22nd, 2016

The University of Applied Sciences in Upper Austria uses Deben tensile stages as an integral part of their computed tomography research and testing facility October 18th, 2016

Chip Technology

Gold standards for nanoparticles: Understanding how small organic ions stabilize gold nanoparticles may allow for better control March 29th, 2017

A big leap toward tinier lines: Self-assembly technique could lead to long-awaited, simple method for making smaller microchip patterns March 27th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Argon is not the 'dope' for metallic hydrogen March 24th, 2017

Nanoelectronics

A big leap toward tinier lines: Self-assembly technique could lead to long-awaited, simple method for making smaller microchip patterns March 27th, 2017

Scientists discover new 'boat' form of promising semiconductor: GeSe Uncommon form attenuates semiconductor's band gap size March 23rd, 2017

UC researchers use gold coating to control luminescence of nanowires: University of Cincinnati physicists manipulate nanowire semiconductors in pursuit of making electronics smaller, faster and cheaper March 17th, 2017

A SOI wafer is a suitable substrate for gallium nitride crystals: Improved characteristics in power electronics and radio applications can be achieved by using a SOI wafer for gallium nitride growth March 4th, 2017

Announcements

Gold standards for nanoparticles: Understanding how small organic ions stabilize gold nanoparticles may allow for better control March 29th, 2017

Tiny sensor lays groundwork for precision X-rays detection via endoscopy:Nanoscale fiber-integrated X-ray sensor opens new doors for medical imaging and radiotherapy March 29th, 2017

Researchers uncover secret of nanomaterial that makes harvesting sunlight easier March 29th, 2017

Information storage with a nanoscale twist: Discovery of a novel rotational force inside magnetic vortices makes it easier to design ultrahigh capacity disk drives March 28th, 2017

Alliances/Trade associations/Partnerships/Distributorships

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

AIM Photonics Welcomes Coventor as Newest Member: US-Backed Initiative Taps Process Modeling Specialist to Enable Manufacturing of High-Yield, High-Performance Integrated Photonic Designs March 16th, 2017

Applied Graphene Materials plc - Significant commercial progress in AGM’s three core sectors March 3rd, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project