Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Abstract:
Joint effort by longtime partners to develop resists for EUVL processing

TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on February 24th, 2010

Tokyo Electron Limited (TEL) and SEMATECH today announced that TEL has joined SEMATECH's Lithography Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

The TEL team will work alongside SEMATECH engineers at CNSE's Albany NanoTech Complex to advance extreme ultraviolet lithography (EUVL) and related infrastructure - including mask defect reduction, mask metrology, source, resist processing, etch, and overall manufacturability and extensibility of the technology.

As the industry prepares to start EUVL pilot line operations within a year, the remaining challenges in EUV resist processing must be addressed, including linewidth roughness (LWR) reduction, LWR uniformity across wafers, partitioning LWR reduction between resist processing and etch, as well as pattern collapse. TEL and SEMATECH are uniquely positioned to cooperate in those areas and to lead the industry in enabling pilot line-ready resist processing.

"We are excited by this opportunity to join TEL's engineering expertise with SEMATECH's R&D capabilities and know-how to develop leading-edge EUV lithography capability for our semiconductor customers," said Masayuki Tomoyasu, Senior Vice President of TEL Technology Center, America, LLC. "We look forward to working with SEMATECH to meet the technical and economic requirements of EUV technology and move the industry forward."

"We are building on our longstanding relationship with TEL, which is also participating in our Front End Processes and 3D Interconnect programs," said John Warlaumont, vice president of advanced technology at SEMATECH. "We're pleased to join forces in our lithography program as well, as we work together with TEL to advance EUVL technology and accelerate its progress to high-volume manufacturing."

"We are delighted to welcome this new alliance between SEMATECH and TEL, both of which are among the global technology leaders engaged in next-generation nanoelectronics research and development at the UAlbany NanoCollege," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "This new collaboration will enable advanced research for EUV lithography to support the critical needs of industry, while further demonstrating the success of the SEMATECH-CNSE partnership in accelerating leading-edge technologies."

Through global leadership and collaboration, SEMATECH's Lithography Program aims to drive consensus-based solutions and infrastructure development to ensure that capable, cost-effective lithography is available when needed to member companies and the semiconductor industry.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About TEL

TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange. www.tel.com

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Anne Englander
512-356-7155


Tokyo Electron Media Contact:
Michelle Pesez
512-424-1757


CNSE Media Contact:
Steve Janack
518-956-7322

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Strength of hair inspires new materials for body armor January 18th, 2017

Self-assembling particles brighten future of LED lighting January 18th, 2017

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Nanoparticle exposure can awaken dormant viruses in the lungs January 17th, 2017

Academic/Education

Oxford Nanoimaging report on how the Nanoimager, a desktop microscope delivering single molecule, super-resolution performance, is being applied at the MRC Centre for Molecular Bacteriology & Infection November 22nd, 2016

The University of Applied Sciences in Upper Austria uses Deben tensile stages as an integral part of their computed tomography research and testing facility October 18th, 2016

Enterprise In Space Partners with Sketchfab and 3D Hubs for NewSpace Education October 13th, 2016

New Agricultural Research Center Debuts at UCF October 12th, 2016

Chip Technology

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Seeing the quantum future... literally: What if big data could help you see the future and prevent your mobile phone from breaking before it happened? January 16th, 2017

NUS researchers achieve major breakthrough in flexible electronics: New classes of printable electrically conducting polymer materials make better electrodes for plastic electronics and advanced semiconductor devices January 14th, 2017

Nanoscale Modifications can be used to Engineer Electrical Contacts for Nanodevices January 13th, 2017

Nanoelectronics

Nano-chimneys can cool circuits: Rice University scientists calculate tweaks to graphene would form phonon-friendly cones January 4th, 2017

Advance in intense pulsed light sintering opens door to improved electronics manufacturing December 23rd, 2016

Fast track control accelerates switching of quantum bits December 16th, 2016

GLOBALFOUNDRIES Demonstrates Industry-Leading 56Gbps Long-Reach SerDes on Advanced 14nm FinFET Process Technology: Proven ASIC IP solution will enable significant performance and power efficiency improvements for next-generation high-speed applications December 13th, 2016

Announcements

Strength of hair inspires new materials for body armor January 18th, 2017

Self-assembling particles brighten future of LED lighting January 18th, 2017

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Nanoparticle exposure can awaken dormant viruses in the lungs January 17th, 2017

Alliances/Trade associations/Partnerships/Distributorships

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project