Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Research at UAlbany NanoCollege Contributes to Over 40 Technical Papers at Leading Global Lithography Forum

CNSE's Albany NanoTech Complex
CNSE's Albany NanoTech Complex

Abstract:
Innovative work by researchers from CNSE and its global corporate partners at CNSE's Albany NanoTech Complex to be featured at SPIE Advanced Lithography Conference

Research at UAlbany NanoCollege Contributes to Over 40 Technical Papers at Leading Global Lithography Forum

Albany, NY | Posted on February 16th, 2010

Innovative research conducted at the College of Nanoscale Science and Engineering's ("CNSE") Albany NanoTech ("ANT") Complex provides the basis for more than 40 scientific and technical papers to be presented next week at one of the world's leading conferences focused on advanced lithography.

The papers will be introduced at the SPIE Advanced Lithography conference, to be held February 21 through 25 in San Jose, CA. They cite leading-edge research performed by CNSE research teams; by global corporate partners' research teams resident at CNSE, including IBM, SEMATECH, GlobalFoundries, Tokyo Electron, Applied Materials, ASML, Vistec Lithography and the National Institute of Standards and Technology ("NIST"); and through collaborative programs involving the UAlbany NanoCollege and its corporate partners' research teams located at CNSE's ANT Complex.

Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ("EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ("e-beam") lithography, nanometrology, and nanoimprint technologies, among others.

Dr. Timothy Groves, CNSE Empire Innovation Professor of Nanoscale Science and Director of CNSE's Center for Nanolithography Development, said, "The presentation of more than 40 scientific and technical papers at the SPIE Advanced Lithography conference based on research performed at CNSE's Albany NanoTech Complex further demonstrates the success of pioneering partnerships between academia and industry in driving cutting-edge research and development. These collaborations are clearly enabling critical innovations in nanoscale lithography that will serve to meet the needs of the global nanoelectronics industry."

Dr. John Hartley, CNSE Professor of Nanoengineering and Director of CNSE's Advanced Lithography Center, said, "The groundbreaking work being done at the UAlbany NanoCollege, from researchers both at CNSE and our world-class roster of global corporate partners, is playing an important role in accelerating the use of lithography technologies for the manufacturing of advanced nanoelectronics devices. We look forward to presenting the results of that leading-edge research and are confident it will enable critical lithography solutions for the benefit of our industrial partners and the industry as a whole."

The 35th annual SPIE conference - considered the nanoelectronics lithography industry's most important technical event - is expected to attract thousands of attendees.

####

About UAlbany NanoCollege
The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE's Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech.

For more information, please click here

Contacts:
Steve Janack
CNSE Vice President for Marketing and Communications
(phone) 518-956-7322
(cell) 518-312-5009

Copyright © UAlbany NanoCollege

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Bosch announces high-performance MEMS acceleration sensors for wearables June 27th, 2017

Nanometrics to Participate in the 9th Annual CEO Investor Summit 2017: Accredited investor and publishing research analyst event held concurrently with SEMICON West and Intersolar 2017 in San Francisco June 27th, 2017

NMRC, University of Nottingham chooses the Quorum Q150 coater for its reliable and reproducible film thickness when coating samples with iridium June 27th, 2017

Picosunís ALD solutions enable novel high-speed memories June 27th, 2017

Chip Technology

Nanometrics to Participate in the 9th Annual CEO Investor Summit 2017: Accredited investor and publishing research analyst event held concurrently with SEMICON West and Intersolar 2017 in San Francisco June 27th, 2017

New TriboLab CMP Provides Cost-Effective Characterization of Chemical Mechanical Wafer Polishing Processes: Bruker Updates Industry-Standard CP-4 Platform for Most Flexible and Reliable Testing June 27th, 2017

Atomic imperfections move quantum communication network closer to reality June 25th, 2017

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

Nanoelectronics

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

GLOBALFOUNDRIES on Track to Deliver Leading-Performance 7nm FinFET Technology: New 7LP technology offers 40 percent performance boost over 14nm FinFET June 13th, 2017

Seeing the invisible with a graphene-CMOS integrated device June 6th, 2017

IBM Research Alliance Builds New Transistor for 5nm Technology: Less than two years since announcing a 7nm test chip, scientists have achieved another breakthrough June 5th, 2017

Announcements

Bosch announces high-performance MEMS acceleration sensors for wearables June 27th, 2017

Nanometrics to Participate in the 9th Annual CEO Investor Summit 2017: Accredited investor and publishing research analyst event held concurrently with SEMICON West and Intersolar 2017 in San Francisco June 27th, 2017

NMRC, University of Nottingham chooses the Quorum Q150 coater for its reliable and reproducible film thickness when coating samples with iridium June 27th, 2017

Picosunís ALD solutions enable novel high-speed memories June 27th, 2017

Interviews/Book Reviews/Essays/Reports/Podcasts/Journals/White papers

Picosunís ALD solutions enable novel high-speed memories June 27th, 2017

Atomic imperfections move quantum communication network closer to reality June 25th, 2017

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Events/Classes

Bosch announces high-performance MEMS acceleration sensors for wearables June 27th, 2017

Nanometrics to Participate in the 9th Annual CEO Investor Summit 2017: Accredited investor and publishing research analyst event held concurrently with SEMICON West and Intersolar 2017 in San Francisco June 27th, 2017

Letiís Autonomous-Vehicle System Embedded in Infineonís AURIX Platform: Letiís Low-Power, Multi-Sensor System that Transforms Distance Data into Clear Information About the Driving Environment Will Be Demonstrated at ITS Meeting in Strasbourg, June 19-22 June 20th, 2017

Nanomechanics to Host High-Speed Nanoindentation Webinar June 21: Leading nanomechanical technology provider will host educational webinar focused on high-speed nanoindentation and mechanical properties mapping June 12th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project