Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Record number of papers at SPIE Advanced Lithography conference reports imec’s progress in advanced lithography

EUV resists are steadily improving and now nicely resolve 27nm LS on the EUV ADT.
EUV resists are steadily improving and now nicely resolve 27nm LS on the EUV ADT.

Abstract:
At next week's SPIE Advanced Lithography Conference (www.spie.org) being held February 22 - 26 in San Jose, California, imec technologists will contribute a record number of over 30 papers showing their newest breakthroughs in advanced semiconductor lithography research.

While imec pushes 193nm to its limits by investigating cost-effective double patterning methods and by source mask optimization for 22nm half pitch, most research has been shifted to EUVL (extreme ultraviolet lithography). Today, EUV is the most promising cost-effective method for insertion at the 22nm node and approaches preproduction at imec by the end of 2010.

Record number of papers at SPIE Advanced Lithography conference reports imec’s progress in advanced lithography

Leuven, Belgium | Posted on February 16th, 2010

EUV approaches preproduction at imec by end 2010

With the installation of Hamatech's MaskTrack Pro photomask cleaning system, imec is now ready to start its research on EUV mask cleaning. Pristine, defect-free masks at point-of-exposure have become a critical issue in the advancement of EUVL. Since EUV masks have no protecting pellicle, each time they are handled, a risk for extra defects due to particle formation exists. As the only research facility with a complete mask integrity infrastructure, imec will now start with some of its key core partners research on innovative mask cleaning technology to make sure that EUV masks are always clean before they are loaded into the scanner. Apart from contamination by particles, potential (photon-induced) organic contamination will also be studied. This unique research will enable to develop processes of record (PORs) for EUV mask cleaning, which will allow to accelerate total process development for yielding manufacturing based on EUV lithography.

Currently, imec is developing EUV process technology by applying ASML's EUV alpha demo tool (ADT); its successor, the EUV preproduction tool (ASML NXE:3100), is scheduled for installation in Q4 2010. Using the ADT, progress has been made on many aspects of EUV Lithography and preparation for the NXE:3100 is on-going.

And promising progress has been achieved in EUV resist performance. Imec now has resists to pattern 27nm features on the alpha demo tool and is confident that suitable resists for 22nm and later on 16nm are within reach on future exposure tools. A set-up to quantify resist outgassing became operational and is now used routinely in material screening and to qualify materials for ADT exposures.

Pushing 193nm lithography towards 22nm

Imec achieved major progress in the cost reduction of double patterning. Imec compares and evaluates chemicals and techniques for litho-process-litho-etch solutions as cost effective alternatives to the litho-etch-litho-etch process. By avoiding the etch step the process cost can be reduced. First results showed a litho-process-litho-etch solution as a viable process, in the first place for designs with a repeated, regular geometry, such as memory ICs. Today, resulting from a lot of research on intelligent design split, imec also reports that litho-process-litho-etch double patterning is a suitable and cost-effective technology for random logic application at 32nm half pitch. And very good critical dimension uniformity (CDU) of the first and second patterns has been measured down to 26nm half pitch.

Imec also started a program on source mask optimization including diffractive optical elements and flexible illuminators to further push 193nm to its limits. With source mask optimization, the illumination shape is tailored to the specific layout to be printed, improving in that way the resolution and process margins to some extent. These results show the potential to push 193nm lithography towards the 22nm node.

"I'm very proud that our lithography research team has achieved these amazing results over the last year. Thanks to their efforts and our unique infrastructure which we expand dependent on the technology needs, we are on track for cost-effective double patterning for the 32nm half pitch node and to introduce EUV at 22nm;" said Kurt Ronse, director advanced lithography program at imec.

####

About imec
Imec is a world-leading independent research center in nanoelectronics and nanotechnology.

Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan.

Its staff of more than 1,650 people include over 550 industrial residents and guest researchers. In 2008, imec's revenue (P&L) was 270 million euro.

For more information, please click here

Contacts:
imec: Katrien Marent
Director of External Communications
T: +32 16 28 18 80
Mobile : +32 474 30 28 66

Copyright © imec

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Zap! Graphene is bad news for bacteria: Rice, Ben-Gurion universities show laser-induced graphene kills bacteria, resists biofouling May 22nd, 2017

Leti Will Demo World’s-first WVGA 10-µm Pitch GaN Microdisplays for Augmented Reality Video at Display Week in Los Angles: Invited Paper also Will Present Leti’s Success with New Augmented Reality Technology That Reduces Pixel Pitch to Less than 5 Microns May 22nd, 2017

Sensors detect disease markers in breath May 19th, 2017

Graphene-nanotube hybrid boosts lithium metal batteries: Rice University prototypes store 3 times the energy of lithium-ion batteries May 19th, 2017

Chip Technology

Plasmon-powered upconversion nanocrystals for enhanced bioimaging and polarized emission: Plasmonic gold nanorods brighten lanthanide-doped upconversion superdots for improved multiphoton bioimaging contrast and enable polarization-selective nonlinear emissions for novel nanoscal May 19th, 2017

Oddball enzyme provides easy path to synthetic biomaterials May 17th, 2017

Racyics Launches ‘makeChip’ Design Service Platform for GLOBALFOUNDRIES’ 22FDX® Technology: Racyics will provide IP and design services as a part of the foundry’s FDXcelerator™ Partner Program May 11th, 2017

Researchers develop transistors that can switch between two stable energy states May 9th, 2017

Nanoelectronics

Oddball enzyme provides easy path to synthetic biomaterials May 17th, 2017

Racyics Launches ‘makeChip’ Design Service Platform for GLOBALFOUNDRIES’ 22FDX® Technology: Racyics will provide IP and design services as a part of the foundry’s FDXcelerator™ Partner Program May 11th, 2017

Researchers “iron out” graphene’s wrinkles: New technique produces highly conductive graphene wafers April 3rd, 2017

A big leap toward tinier lines: Self-assembly technique could lead to long-awaited, simple method for making smaller microchip patterns March 27th, 2017

Announcements

Zap! Graphene is bad news for bacteria: Rice, Ben-Gurion universities show laser-induced graphene kills bacteria, resists biofouling May 22nd, 2017

Leti Will Demo World’s-first WVGA 10-µm Pitch GaN Microdisplays for Augmented Reality Video at Display Week in Los Angles: Invited Paper also Will Present Leti’s Success with New Augmented Reality Technology That Reduces Pixel Pitch to Less than 5 Microns May 22nd, 2017

Sensors detect disease markers in breath May 19th, 2017

Graphene-nanotube hybrid boosts lithium metal batteries: Rice University prototypes store 3 times the energy of lithium-ion batteries May 19th, 2017

Interviews/Book Reviews/Essays/Reports/Podcasts/Journals/White papers

Zap! Graphene is bad news for bacteria: Rice, Ben-Gurion universities show laser-induced graphene kills bacteria, resists biofouling May 22nd, 2017

Sensors detect disease markers in breath May 19th, 2017

Graphene-nanotube hybrid boosts lithium metal batteries: Rice University prototypes store 3 times the energy of lithium-ion batteries May 19th, 2017

Plasmon-powered upconversion nanocrystals for enhanced bioimaging and polarized emission: Plasmonic gold nanorods brighten lanthanide-doped upconversion superdots for improved multiphoton bioimaging contrast and enable polarization-selective nonlinear emissions for novel nanoscal May 19th, 2017

Events/Classes

Leti Will Demo World’s-first WVGA 10-µm Pitch GaN Microdisplays for Augmented Reality Video at Display Week in Los Angles: Invited Paper also Will Present Leti’s Success with New Augmented Reality Technology That Reduces Pixel Pitch to Less than 5 Microns May 22nd, 2017

Oxford Instruments Asylum Research and Microscopy and Analysis Present the Webinar: “Video-Rate Atomic Force Microscopy Enables New Research Opportunities” May 9th, 2017

Graphene flagship steers towards higher technology readiness level May 4th, 2017

Precision NanoSystems @ CLINAM 2017 May 3rd, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project