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Home > Press > SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Collaboration at CNSE's Albany NanoTech Complex to accelerate mask, source, and manufacturing solutions

SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Albany, NY and Veldhoven, the Netherlands | Posted on February 9th, 2010

SEMATECH, the global consortium of the world's leading semiconductor manufacturers, and ASML, a leading provider of lithography systems for the chip industry, announced today that ASML has joined SEMATECH's Lithography program at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

As a member of the Lithography program, ASML will team with researchers at SEMATECH to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction, mask metrology infrastructure, source development, resist and materials development, and overall manufacturability and extendibility.

EUV is a new lithographic method using a source wavelength 15 times shorter than current lithography systems, enabling semiconductor scaling to resolutions of 10 nanometers (nm) and smaller. EUV, the leading candidate for manufacturing advanced semiconductors at the 22nm technology generation and beyond, will support Moore's Law - the trend towards more powerful, energy-efficient yet affordable chips - for at least another 10 years.

"This partnership combines ASML's vast array of technical expertise and recognized leadership in the industry with SEMATECH's experience in building infrastructure for next-generation lithography technologies," said John Warlaumont, SEMATECH's vice president of advanced technology. "We share a commitment to keep EUVL on track for cost-effective high volume manufacturing, and will work together to continue the progress being made in EUV technology development to enable pilot and production lines."

"As a single exposure solution and extendible technology, EUV provides the most cost-effective lithography for volume production of sub-3xnm devices," said Ron Kool, Vice President of EUV Lithography Systems at ASML. "Our collaboration with SEMATECH and CNSE demonstrates the industry's commitment to EUV technology and the infrastructure necessary to extend semiconductor shrink for another decade or more."

"The leading-edge research and development that is critical for the commercialization of EUVL technology will be further enhanced by this broader engagement with ASML," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia. "This partnership further leverages the SEMATECH-CNSE collaboration and builds on the world-class capabilities at the UAlbany NanoCollege in support of the advanced technology needs of our global corporate partners and the nanoelectronics industry."

SEMATECH, ASML, and CNSE have long collaborated in advanced lithography technology at the UAlbany NanoCollege, currently working together in such areas as EUV reticle carrier standards and developing ASML's alpha scanner at CNSE. In addition to EUVL challenges, SEMATECH Lithography also focuses on extending 193 nm immersion lithography, investigating alternative lithography technologies, and developing advanced resists for both immersion and EUV through the Resist and Materials Development Center at CNSE. SEMATECH members represent more than half the world's semiconductor production.


For over 20 years, SEMATECH® (, the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit

About ASML

ASML is the world's leading provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. ASML has more than 6,500 employees (expressed in full time equivalents), serving chip manufacturers in more than 60 locations in 15 countries. More information about our company, our products and technology, and career opportunities is available on our website:

For more information, please click here

CNSE Media Contact:
Steve Janack
Phone: 518-956-7322

SEMATECH Media Contact:
Anne Englander
Phone: 512 356-7155

ASML Media Contact:
Ryan Young
Phone: 480 383-4733

Copyright © SEMATECH

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