Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Abstract:
Collaboration at CNSE's Albany NanoTech Complex to accelerate mask, source, and manufacturing solutions

SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Albany, NY and Veldhoven, the Netherlands | Posted on February 9th, 2010

SEMATECH, the global consortium of the world's leading semiconductor manufacturers, and ASML, a leading provider of lithography systems for the chip industry, announced today that ASML has joined SEMATECH's Lithography program at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

As a member of the Lithography program, ASML will team with researchers at SEMATECH to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction, mask metrology infrastructure, source development, resist and materials development, and overall manufacturability and extendibility.

EUV is a new lithographic method using a source wavelength 15 times shorter than current lithography systems, enabling semiconductor scaling to resolutions of 10 nanometers (nm) and smaller. EUV, the leading candidate for manufacturing advanced semiconductors at the 22nm technology generation and beyond, will support Moore's Law - the trend towards more powerful, energy-efficient yet affordable chips - for at least another 10 years.

"This partnership combines ASML's vast array of technical expertise and recognized leadership in the industry with SEMATECH's experience in building infrastructure for next-generation lithography technologies," said John Warlaumont, SEMATECH's vice president of advanced technology. "We share a commitment to keep EUVL on track for cost-effective high volume manufacturing, and will work together to continue the progress being made in EUV technology development to enable pilot and production lines."

"As a single exposure solution and extendible technology, EUV provides the most cost-effective lithography for volume production of sub-3xnm devices," said Ron Kool, Vice President of EUV Lithography Systems at ASML. "Our collaboration with SEMATECH and CNSE demonstrates the industry's commitment to EUV technology and the infrastructure necessary to extend semiconductor shrink for another decade or more."

"The leading-edge research and development that is critical for the commercialization of EUVL technology will be further enhanced by this broader engagement with ASML," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia. "This partnership further leverages the SEMATECH-CNSE collaboration and builds on the world-class capabilities at the UAlbany NanoCollege in support of the advanced technology needs of our global corporate partners and the nanoelectronics industry."

SEMATECH, ASML, and CNSE have long collaborated in advanced lithography technology at the UAlbany NanoCollege, currently working together in such areas as EUV reticle carrier standards and developing ASML's alpha scanner at CNSE. In addition to EUVL challenges, SEMATECH Lithography also focuses on extending 193 nm immersion lithography, investigating alternative lithography technologies, and developing advanced resists for both immersion and EUV through the Resist and Materials Development Center at CNSE. SEMATECH members represent more than half the world's semiconductor production.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

About ASML

ASML is the world's leading provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. ASML has more than 6,500 employees (expressed in full time equivalents), serving chip manufacturers in more than 60 locations in 15 countries. More information about our company, our products and technology, and career opportunities is available on our website: www.asml.com

For more information, please click here

Contacts:
CNSE Media Contact:
Steve Janack
Phone: 518-956-7322


SEMATECH Media Contact:
Anne Englander
Phone: 512 356-7155


ASML Media Contact:
Ryan Young
Phone: 480 383-4733

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Finding a new formula for concrete: Researchers look to bones and shells as blueprints for stronger, more durable concrete May 26th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

Academic/Education

Graphene: Progress, not quantum leaps May 23rd, 2016

Smithsonian Science Education Center and National Space Society Team Up for Next-Generation Space Education Program "Enterprise In Space" May 11th, 2016

The University of Colorado Boulder, USA, combines Raman spectroscopy and nanoindentation for improved materials characterisation May 9th, 2016

Albertan Science Lab Opens in India May 7th, 2016

Chip Technology

Gigantic ultrafast spin currents: Scientists from TU Wien (Vienna) are proposing a new method for creating extremely strong spin currents. They are essential for spintronics, a technology that could replace today's electronics May 25th, 2016

Diamonds closer to becoming ideal semiconductors: Researchers find new method for doping single crystals of diamond May 25th, 2016

Dartmouth team creates new method to control quantum systems May 24th, 2016

Attosecond physics: A switch for light-wave electronics May 24th, 2016

Nanoelectronics

Researchers demonstrate size quantization of Dirac fermions in graphene: Characterization of high-quality material reveals important details relevant to next generation nanoelectronic devices May 20th, 2016

Graphene: A quantum of current - When current comes in discrete packages: Viennese scientists unravel the quantum properties of the carbon material graphene May 20th, 2016

New type of graphene-based transistor will increase the clock speed of processors: Scientists have developed a new type of graphene-based transistor and using modeling they have demonstrated that it has ultralow power consumption compared with other similar transistor devices May 19th, 2016

Self-healing, flexible electronic material restores functions after many breaks May 17th, 2016

Announcements

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Finding a new formula for concrete: Researchers look to bones and shells as blueprints for stronger, more durable concrete May 26th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

Alliances/Trade associations/Partnerships/Distributorships

The CEA Announces Expanded Collaboration with Intel to Advance Cutting-edge Research and Innovation in Key Digital Areas May 17th, 2016

Solliance realizes first up-scaled Perovskite based PV modules with 10% efficiency: Holst Centre, imec and ECN pave the road to upscaling Perovskite PV modules May 10th, 2016

Industrial Nanotech, Inc. Expands Distribution Network in US and Internationally May 9th, 2016

Albertan Science Lab Opens in India May 7th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic