Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Abstract:
Collaboration at CNSE's Albany NanoTech Complex to accelerate mask, source, and manufacturing solutions

SEMATECH and ASML Form Partnership at UAlbany NanoCollege

Albany, NY and Veldhoven, the Netherlands | Posted on February 9th, 2010

SEMATECH, the global consortium of the world's leading semiconductor manufacturers, and ASML, a leading provider of lithography systems for the chip industry, announced today that ASML has joined SEMATECH's Lithography program at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

As a member of the Lithography program, ASML will team with researchers at SEMATECH to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction, mask metrology infrastructure, source development, resist and materials development, and overall manufacturability and extendibility.

EUV is a new lithographic method using a source wavelength 15 times shorter than current lithography systems, enabling semiconductor scaling to resolutions of 10 nanometers (nm) and smaller. EUV, the leading candidate for manufacturing advanced semiconductors at the 22nm technology generation and beyond, will support Moore's Law - the trend towards more powerful, energy-efficient yet affordable chips - for at least another 10 years.

"This partnership combines ASML's vast array of technical expertise and recognized leadership in the industry with SEMATECH's experience in building infrastructure for next-generation lithography technologies," said John Warlaumont, SEMATECH's vice president of advanced technology. "We share a commitment to keep EUVL on track for cost-effective high volume manufacturing, and will work together to continue the progress being made in EUV technology development to enable pilot and production lines."

"As a single exposure solution and extendible technology, EUV provides the most cost-effective lithography for volume production of sub-3xnm devices," said Ron Kool, Vice President of EUV Lithography Systems at ASML. "Our collaboration with SEMATECH and CNSE demonstrates the industry's commitment to EUV technology and the infrastructure necessary to extend semiconductor shrink for another decade or more."

"The leading-edge research and development that is critical for the commercialization of EUVL technology will be further enhanced by this broader engagement with ASML," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia. "This partnership further leverages the SEMATECH-CNSE collaboration and builds on the world-class capabilities at the UAlbany NanoCollege in support of the advanced technology needs of our global corporate partners and the nanoelectronics industry."

SEMATECH, ASML, and CNSE have long collaborated in advanced lithography technology at the UAlbany NanoCollege, currently working together in such areas as EUV reticle carrier standards and developing ASML's alpha scanner at CNSE. In addition to EUVL challenges, SEMATECH Lithography also focuses on extending 193 nm immersion lithography, investigating alternative lithography technologies, and developing advanced resists for both immersion and EUV through the Resist and Materials Development Center at CNSE. SEMATECH members represent more than half the world's semiconductor production.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

About ASML

ASML is the world's leading provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. ASML has more than 6,500 employees (expressed in full time equivalents), serving chip manufacturers in more than 60 locations in 15 countries. More information about our company, our products and technology, and career opportunities is available on our website: www.asml.com

For more information, please click here

Contacts:
CNSE Media Contact:
Steve Janack
Phone: 518-956-7322


SEMATECH Media Contact:
Anne Englander
Phone: 512 356-7155


ASML Media Contact:
Ryan Young
Phone: 480 383-4733

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Pixel-array quantum cascade detector paves the way for portable thermal imaging devices: Research team from TU-Wien Center for Micro- and Nanostructures have developed a new 'cooler' sensing instrument thereby increasing energy-efficiency and enhancing mobility for diagnostic tes July 28th, 2016

Dirty to drinkable: Engineers develop novel hybrid nanomaterials to transform water July 28th, 2016

Thomas Swan and NGI announce unique partnership July 28th, 2016

Penn team uses nanoparticles to break up plaque and prevent cavities July 28th, 2016

Academic/Education

Thomas Swan and NGI announce unique partnership July 28th, 2016

The NanoWizard® AFM from JPK is applied for interdisciplinary research at the University of South Australia for applications including smart wound healing and how plants can protect themselves from toxins July 26th, 2016

News from Quorum: The College of New Jersey use the Quorum Cryo-SEM preparation system in a project to study ice crystals in high altitude clouds July 19th, 2016

Leti and Korea Institute of Science and Technology to Explore Collaboration on Advanced Technologies for Digital Era July 14th, 2016

Chip Technology

Beating the heat a challenge at the nanoscale: Rice University scientists detect thermal boundary that hinders ultracold experiments July 28th, 2016

New nontoxic process promises larger ultrathin sheets of 2-D nanomaterials July 27th, 2016

Nanometrics Reports Second Quarter 2016 Financial Results July 26th, 2016

Integration of novel materials with silicon chips makes new 'smart' devices possible July 25th, 2016

Nanoelectronics

Beating the heat a challenge at the nanoscale: Rice University scientists detect thermal boundary that hinders ultracold experiments July 28th, 2016

New nontoxic process promises larger ultrathin sheets of 2-D nanomaterials July 27th, 2016

Ultra-flat circuits will have unique properties: Rice University lab studies 2-D hybrids to see how they differ from common electronics July 25th, 2016

Borrowing from pastry chefs, engineers create nanolayered composites: Method to stack hundreds of nanoscale layers could open new vistas in materials science July 25th, 2016

Announcements

Pixel-array quantum cascade detector paves the way for portable thermal imaging devices: Research team from TU-Wien Center for Micro- and Nanostructures have developed a new 'cooler' sensing instrument thereby increasing energy-efficiency and enhancing mobility for diagnostic tes July 28th, 2016

Dirty to drinkable: Engineers develop novel hybrid nanomaterials to transform water July 28th, 2016

Thomas Swan and NGI announce unique partnership July 28th, 2016

Penn team uses nanoparticles to break up plaque and prevent cavities July 28th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Thomas Swan and NGI announce unique partnership July 28th, 2016

Starpharma initiates new DEP™ drug delivery program with AstraZeneca July 27th, 2016

XEI Scientific Partners with Electron Microscopy Sciences to Promote and Sell its Products in North and South America July 25th, 2016

Leti and Korea Institute of Science and Technology to Explore Collaboration on Advanced Technologies for Digital Era July 14th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic