Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Metryx Receives Multiple System Follow-On Order from Inotera

Abstract:
Mass metrology innovators, Metryx, Limited, today announced the receipt of a multiple system follow-on order from Taiwanese semiconductor memory manufacturer, Inotera Memories, Inc. The order is for Metryx's Mentor DF3 platform and will be used initially to monitor etch applications.

Metryx Receives Multiple System Follow-On Order from Inotera

BRISTOL, UK | Posted on January 24th, 2008

"Winning follow-on orders is another significant step forward for both company and technology," stated Dr. Adrian Kiermasz, president and CEO of Metryx. "Clearly, leading-edge manufacturers are seeing the benefit of the technology and are finding it increasingly indispensable to their manufacturing productivity."

"The Mentor's ability to effectively monitor our processes and keep process tools from drifting were the key to our decision to place additional orders for Metryx's technology," stated Joey Hsu, Deputy Director of Advanced Engineering Service at Inotera. "The fact that the DF3 can be used in-line and on product wafers makes it particularly effective in a high-volume manufacturing environment."

The Mentor DF3 offers atomic layer measurement accuracy for high volume 300 mm manufacturing environments. Designed to monitor changes in process performance, the DF3 quickly determines whether device manufacturer's process steps are operating correctly by measuring the mass of any wafer following a process step. Simple comparison with the measurements of a reference wafer enable the tool to reliably and accurately identify process changes after deposition, wet or dry etch, or CMP processing. The tool achieves measurements with a resolution of 10 micrograms and accuracy equivalent to 1~5 Angstroms in thickness, depending on the material type.

About Inotera

Inotera Memories, Inc. was incorporated on January 23rd, 2003. Inotera is a joint venture between Qimonda AG and Nanya Technology Corporation. Inotera's production facilities have been designed to manufacture high-density and high-performance commodity DRAM (Dynamic Random Access Memory) products using state-of-the-art trench technology. The combination of Qimonda's (the former Memory Products Group of Infineon Technologies) world leading technology and Nanya's cost-efficiency in mass production has resulted in an innovative company that is highly productive, highly competitive and at the leading edge in the DRAM industry. For more information please visit www.inotera.com.

####

About Metryx
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’s non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control. For more information on the company and its products please visit www.metryx.net.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz
+44 (0)127 586 6260

or
Impress Public Relations
Dave Richardson
415-994-1423

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Chip Technology

A nano-roundabout for light December 10th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Announcements

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Tools

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Controlled electron pulses November 30th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

New-Contracts/Sales/Customers

Cetim Facility Receives Bruker Contour CMM Dimensional Analysis System: New Optical Coordinate Measurement Technology Enables High-Precision 3D Scanning November 16th, 2016

Industrial Nanotech, Inc. Announces Plans to Spin Off New Product Line to Major Paint Compan November 9th, 2016

Leti Provides New Low-noise Image Technology to French SME PYXALIS; Will Be Demonstrated at Vision 2016 in Stuttgart November 3rd, 2016

DryWired's Liquid Nanotint to be the first nano-insulation in a Federal building: 250,000 federal buildings, most with uninsulated glass October 12th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project