Nanotechnology Now





Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > An ultralow-cost, large area way for nanoelectronics fabrication

June 26th, 2007

An ultralow-cost, large area way for nanoelectronics fabrication

Abstract:
Nanoimprinting lithography (NIL) is a simple pattern transfer process that is emerging as an alternative nanopatterning technology to traditional photolithography. NIL allows the fabrication of two-dimensional or three-dimensional structures with submicrometer resolution and the patterning and modification of functional materials. A key benefit of nanoimprint lithography is its sheer simplicity. There is no need for complex optics or high-energy radiation sources with a nanoimprint tool. There is no need for finely tailored photoresists designed for both resolution and sensitivity at a given wavelength. The simplified requirements of the technology allow low-cost, high-throughput production processes of various nanostructures with operational ease. NIL already has been applied in various fields such as biological nanodevices, nanophotonic devices, organic electronics, and the patterning of magnetic materials. Researchers at Berkeley have taken this process one step further by demonstrating that direct nanoimprinting of metal nanoparticles enables low temperature metal deposition as well as high-resolution patterning. This approach has substantial potential to take advantage of nanoimprinting for the application in ultralow cost, large area printed electronics.

Source:
nanowerk.com

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Nanometrics Announces Live Webcast of Upcoming Investor and Analyst Day May 20th, 2015

Sandia researchers first to measure thermoelectric behavior by 'Tinkertoy' materials May 20th, 2015

Defects can 'Hulk-up' materials: Berkeley lab study shows properly managed damage can boost material thermoelectric performances May 20th, 2015

GLOBALFOUNDRIES Offers New Low-Power 28nm Solution for High-Performance Mobile and IoT Applications: Technology is the first in the industry to provide design enablement support optimized to meet low power requirements of RF SoCs May 20th, 2015

Nanoelectronics

Random nanowire configurations increase conductivity over heavily ordered configurations May 16th, 2015

Channeling valleytronics in graphene: Berkeley Lab researchers discover 1-D conducting channels in bilayer graphene May 6th, 2015

A better way to build DNA scaffolds: McGill researchers devise new technique to produce long, custom-designed DNA strands May 6th, 2015

Surface matters: Huge reduction of heat conduction observed in flat silicon channels April 23rd, 2015

Interviews/Book Reviews/Essays/Reports/Podcasts/Journals/White papers

Conversion of Greenhouse Gases to Syngas in Presence of Nanocatalysts in Iran May 22nd, 2015

Simulations predict flat liquid May 21st, 2015

Researchers develop new way to manufacture nanofibers May 21st, 2015

Nanotherapy effective in mice with multiple myeloma May 21st, 2015

Printing/Lithography/Inkjet/Inks

Printing 3-D graphene structures for tissue engineering: A new ink formulation allows for the 3-D printing of graphene structures May 19th, 2015

ORNL demonstrates first large-scale graphene fabrication May 14th, 2015

New JEOL E-Beam Lithography System to Enhance Quantum NanoFab Capabilities May 6th, 2015

Inkjet printing process for kesterite solar cells May 6th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project