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April 21st, 2006
Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography in patterning integrated circuits and other small-scale structures into polymers.
Results of the three-year study, conducted by researchers at the Georgia Institute of Technology and Sandia National Laboratories, provide a “road map” to guide development of next-generation micron- and nanometer scale high-resolution imprint manufacturing. By reducing cost and time, the design rules could help make high-volume production of nanotechnology-based products more economically feasible.
Georgia Institute of Technology
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