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April 13th, 2005
Advance Nanotech today announced that it has invested in the procurement of an electron beam lithography (EBL) tool for use on the development of Advance Nanotech technologies at the University of Cambridge.
"The Nanobeam NB0 electron beam lithography tool provides us with rapid prototyping capabilities for building next generation nanodevices," said Bill Milne, a member of the Advance Nanotech Scientific Advisory Board.
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