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Home > News > Guru plumbs nanotech in all dimensions

March 15th, 2005

Guru plumbs nanotech in all dimensions

Abstract:
Yoshio Nishi keeps adding new facets to a sparkling career. Nishi spent 20 years at Toshiba Corp., where he did pioneering work on applying electron-spin resonance techniques to study the silicon-oxide interface. He then jumped the Pacific, eventually heading up silicon technology development at Texas Instruments Inc. Today, he is director of two centers at Stanford University: the Stanford Nanofabrication Facility and the Center for Integrated Systems. Nishi sat down recently with EE Times to talk about nanoelectronics research.

Source:
EETimes

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