- About Us
- Nano-Social Network
- Nano Consulting
- My Account
January 12th, 2005
Now that it has proven immersion lithography is viable in the lab, IBM Corp.'s Microelectronics Group on Monday (Jan. 10) said it will insert the technology within its 300-mm production fab.
Many expect immersion to emerge in production fabs at the 45-nm node, which is expected in the 2007 time frame.
|Related News Press|
Arrowhead Provides Response to New Minority Shareholder Announcement January 7th, 2017
Harris & Harris Group Announces a Proposed Strategic Restructuring December 20th, 2016
NUS researchers achieve major breakthrough in flexible electronics: New classes of printable electrically conducting polymer materials make better electrodes for plastic electronics and advanced semiconductor devices January 14th, 2017
Fast track control accelerates switching of quantum bits December 16th, 2016
GLOBALFOUNDRIES Demonstrates Industry-Leading 56Gbps Long-Reach SerDes on Advanced 14nm FinFET Process Technology: Proven ASIC IP solution will enable significant performance and power efficiency improvements for next-generation high-speed applications December 13th, 2016
Strength of hair inspires new materials for body armor January 18th, 2017
Self-assembling particles brighten future of LED lighting January 18th, 2017
Nanoparticle exposure can awaken dormant viruses in the lungs January 17th, 2017