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Home > News > IBM to install immersion litho in 300-mm fab

January 12th, 2005

IBM to install immersion litho in 300-mm fab

Abstract:
Now that it has proven immersion lithography is viable in the lab, IBM Corp.'s Microelectronics Group on Monday (Jan. 10) said it will insert the technology within its 300-mm production fab.

Many expect immersion to emerge in production fabs at the 45-nm node, which is expected in the 2007 time frame.

Source:
EETimes

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