Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH and Newly Merged SUNY CNSE/SUNYIT Launch New Patterning Center to Further Advance Materials Development: Center to Provide Access to Critical Tools that Support Semiconductor Technology Node Development

Abstract:
SEMATECH and the newly merged SUNY College of Nanoscale Science and Engineering (CNSE) / SUNY Institute of Technology (SUNYIT) announced today they have launched their joint Patterning Center of Excellence. The new Center will leverage the CNSE/SUNYIT lithography infrastructure which includes state-of-the-art film deposition and etch capability, leading-edge patterning systems and SEMATECH's Resist Materials Development Center's (RMDC) world class EUV imaging capabilities.

SEMATECH and Newly Merged SUNY CNSE/SUNYIT Launch New Patterning Center to Further Advance Materials Development: Center to Provide Access to Critical Tools that Support Semiconductor Technology Node Development

Albany, NY | Posted on August 7th, 2014

The Patterning Center of Excellence (CoE) will enable lithography equipment and lithographic materials manufacturing companies access to a vertically integrated semiconductor processing facility. The new Center aims to reduce the tangible and intangible costs of developing critical lithography materials for individual semiconductor companies. CNSE has continued to build capability, enabling technological excellence as represented by the Center for Semiconductor Research (CSR), a leading-edge research center valued at more than $1 billion established at CNSE in May 2005; the Global 450 Consortium (G450C), which is focused on building the 450mm wafer and equipment development environment; and by CNSE's membership in SEMATECH.

"Building on SEMATECH's recent achievements in mask blank and resist, the new Patterning Center will provide the critical capabilities that will continue to produce the results that our members and the industry need to show that EUV lithography is manufacturable," said Michael Lercel Senior Director and Chief Technologist at SEMATECH. "Furthermore, the new Center will provide an excellent platform for advancing cost-effective semiconductor materials and process solutions needed to enable EUV and emerging patterning technologies."

"The new Patterning Center further builds on the world-class capabilities enabled by the SEMATECH-CNSE/SUNYIT partnership to support the commercialization of EUVL technologies," said Dr. Michael Liehr, Executive Vice President of Innovation and Technology of the newly merged CNSE/SUNYIT. "New York State continues to chart a pioneering path for the semiconductor industry under the leadership of Governor Andrew Cuomo, and we are delighted to support the advanced technology needs of our global corporate partners and the industry."

Advances in lithographic patterning critically depend on the timely availability of enabling resists and materials. The new center, a vital component that builds on SEMATECH's mask blank and novel imaging efforts, will enable companies to assess their materials, test new tooling, and validate designs for the manufacturing EUVL and other next-generation technologies through access to the newly merged CNSE/SUNYIT's advanced fabrication facilities.

"The challenges for advanced lithography are developing resist processes that meet the stringent resolution, linewidth roughness, and sensitivity specifications," said Kevin Cummings, SEMATECH's Director of Lithography. "These processes will not be available in time without intervention, and the Patterning Center is the place where the industry's the most advanced technologists can come together and partner to commercialize extreme ultraviolet (EUV) lithography and other technologies for the manufacturing of future nanoelectronics devices."

"The industry is at a crossroads," said Warren Montgomery, Assistant Vice President of Advanced Technology and Business Development at the newly merged CNSE/SUNYIT. "The high cost of R&D has made it very difficult to do the research and development needed to continue the drive to smaller and smaller features sizes. The creation of collaborative ‘centers' like the Centers of Excellence at CNSE and this newly created Patterning Center, being created by CNSE and SEMATECH, will enable R&D to continue while keeping the economics reasonable."

"SEMATECH remains committed to finding cost-effective solutions through its connections with a broad base of member company engineers, suppliers, and academic researchers to ensure the affordable evolution of emerging lithography technologies," said Edward Barth Director of Strategic Growth Initiatives at SEMATECH. "Building on SEMATECH's latest development efforts in mask and novel imaging, the new Center will provide an excellent platform for advancing cost-effective semiconductor materials and process solutions for future nanoelectronics devices."

Over the past decade, SEMATECH has enabled fast cycle time of resist and materials development by providing the industry access to successive generations of small field exposure tools. In addition, SEMATECH's projects have succeeded in measuring the outgassing characteristics in hundreds of EUV resists and materials formulations, and delivering thousands of EUV exposure shifts to member companies that have enabled tens of thousands of materials formulations to be evaluated.

CNSE/SUNYIT has, over the past decade, enabled advanced 193nm resist and materials development, etch characterization, defect characterization and integrated process flow demonstration to its partner ecosystem.

SEMATECH and CNSE/SUNYIT's new Patterning Center is taking the collaboration with CNSE/SUNY IT and its global ecosystem and research network one step further by enabling them to share the costs for advancing resist and materials and process development to support the critical needs of industry.

For more information on membership benefits and participation in the Patterning Center of Excellence, please contact Edward Barth at , Kevin Cummings at or Warren Montgomery at .

####

About SUNY College of Nanoscale Science and Engineering
The SUNY College of Nanoscale Science and Engineering (CNSE) is the world leader in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE represents the world’s most advanced university-driven research enterprise, with more than $20 billion in high-tech investments and over 300 corporate partners. The 1.3 million-square-foot Albany NanoTech megaplex is home to more than 3,100 scientists, researchers, engineers, students, and faculty. CNSE maintains a statewide footprint, operating the Smart Cities Technology Innovation Center (SCiTI) at Kiernan Plaza in Albany, the Solar Energy Development Center in Halfmoon, the Photovoltaic Manufacturing and Technology Development Facility in Rochester, and the Smart System Technology and Commercialization Center (STC) in Canandaigua. CNSE co-founded and manages the Computer Chip Commercialization Center (Quad-C) at SUNYIT and is lead developer of the Marcy Nanocenter site in Utica, as well as the Buffalo High-Tech Manufacturing Complex, Buffalo Information Technologies Innovation and Commercialization Hub, and Medical Innovation and Commercialization Hub. For information, visit www.sunycnse.com.

About SUNYIT

SUNYIT, the State University of New York Institute of Technology at Utica/Rome, is New York’s public polytechnic, offering undergraduate and graduate degree programs in technology and professional studies. Its academic offerings in technology, including engineering, cybersecurity, computer science, and the engineering technologies, and its programs in professional studies, including business, communication, and nursing, are complemented by athletics, recreational, cultural and campus life programs, events, and activities. Founded in 1966, SUNYIT is a unique high-tech learning environment on hundreds of acres, offering degree programs online as well as on campus. The SUNYIT family of alumni now numbers 25,000. For information, visit www.sunyit.edu.

About SEMATECH

For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

For more information, please click here

Contacts:
SEMATECH
Erica McGill
Phone: (518) 649-1041


SUNY CNSE/SUNYIT
Jerry Gretzinger
Phone: (518) 956-7359

Copyright © SUNY College of Nanoscale Science and Engineering

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

MEMS & Sensors Technology Showcase: Finalists Announced for MEMS Executive Congress US 2014 October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

Openings/New facilities/Groundbreaking/Expansion

HP Supercomputer at NREL Garners Top Honor October 19th, 2014

Graphenea opens US branch October 16th, 2014

Raytheon, UMass Lowell open on-campus research institute: Industry leader’s researchers to collaborate with faculty, students to move key technologies forward through first-of-its-kind partnership October 11th, 2014

Yale University and Leica Microsystems Partner to Establish Microscopy Center of Excellence: Yale Welcomes Scientists to Participate in Core Facility Opening and Super- Resolution Workshops October 20 Through 31, 2014 September 30th, 2014

Academic/Education

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

First Canada Excellence Research Chair gets $10 million from the federal government for oilsands research at the University of Calgary: Federal government announces prestigious research chair to study improving oil production efficiency October 19th, 2014

Raytheon, UMass Lowell open on-campus research institute: Industry leader’s researchers to collaborate with faculty, students to move key technologies forward through first-of-its-kind partnership October 11th, 2014

SUNY Colleges of Nanoscale Science and Engineering and National Institute for Occupational Safety and Health Announce Expanded Partnership October 2nd, 2014

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Announcements

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Advancing thin film research with nanostructured AZO: Innovnano’s unique and cost-effective AZO sputtering targets for the production of transparent conducting oxides October 23rd, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Alliances/Partnerships/Distributorships

European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

VDMA photonics steering committee with new members stronger than ever October 14th, 2014

Research partnerships

NYU Researchers Break Nano Barrier to Engineer the First Protein Microfiber October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

RF Heating of Magnetic Nanoparticles Improves the Thawing of Cryopreserved Biomaterials October 23rd, 2014

Brookhaven Lab Launches Computational Science Initiative:Leveraging computational science expertise and investments across the Laboratory to tackle "big data" challenges October 22nd, 2014

Printing/Lithography/Inkjet/Inks

3DXNano™ ESD Carbon Nanotube 3D Printing Filament - optimized for demanding 3D printing applications in the semi-con and electronics industry October 16th, 2014

Aculon NanoClear Stencil Solution Wins 2014 Global Technology Award at SMTAI October 12th, 2014

Fast, cheap nanomanufacturing: Arrays of tiny conical tips that eject ionized materials could fabricate nanoscale devices cheaply October 4th, 2014

'Greener,' low-cost transistor heralds advance in flexible electronics September 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE