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Nanonex Corporation, the inventor of nanoimprint lithography and the world's leading provider in nanoimprint lithography solutions with the longest history, announces the purchase of Nanonex's NX-B200 system by East China University of Science and Technology (ECUST).
The Nanonex NX-B200 is a cost-effective and versatile full wafer nanoimprint tool with sub-5 nm imprinting resolution. It offers all forms of imprint up to 3 inch wafer size: thermal, photocurable and embossing in a compact and reliable field proven design.
Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-B200 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, and significantly increases mask lifetime. The small thermal mass design allows fast thermal cycling, resulting in a fast process cycle.
The NX-B200 system will support the multidisciplinary research at ECUST including nanoimprint material and processing. Nanonex is excited to supply the cutting-edge nanoimprint tool to ECUST and other research universities across China to boost the research and development efforts.
About Nanonex Corporation
Nanonex is the inventor of nanoimprint lithography (NIL), the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary NIL solutions and Air Cushion Press™ can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, bio/chemical sensors, biotech, chemical synthesis, and advanced materials. Nanonex has over 150 customers and an installed base of over 70 tools worldwide.
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