Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Meaglow Plasma Source Provides Major Breakthrough for Advanced Semiconductor Production Technique

Abstract:
Meaglow Ltd. (Privately Held) announces a breakthrough in semiconductor production. As computer chips become smaller and smaller, advanced production techniques, such as Atomic Layer Deposition (ALD) have become more important for depositing thin layers of material. Unfortunately the ALD of some materials has been prone to contamination from the plasma sources used. Meaglow Ltd has developed a hollow cathode plasma source which has reduced oxygen contamination by orders of magnitude, allowing the reproducible deposition of semiconductor materials with improved quality.

Meaglow Plasma Source Provides Major Breakthrough for Advanced Semiconductor Production Technique

Thunder Bay, Canada | Posted on March 13th, 2014

The breakthrough has been shown in a recent publication of oxygen reduction figures for the hollow cathode plasma source supplied last year to the group of Professor Necmi Biyikli, of the Institute of Materials Science and Nanotechnology, at Bilkent University in Turkey. The plasma source was used to upgrade their existing Atomic Layer Deposition (ALD) system by replacing an inductively coupled plasma source. The publication in the Journal of Materials Chemistry C (J. Mater. Chem. C 2 (2014) 2123) shows a reduction in oxygen content of orders of magnitude compared to previous results. There is also a marked improvement in material quality. These results render the older inductively coupled plasma sources obsolete for many applications.

Meaglow is seeking other customers interested in improving the material quality of their ALD and other plasma grown nitride layers. The hollow cathode plasma technology also has the advantage of scalability to large deposition areas. The Plasma source can be used to retrofit existing systems or can be integrated with equipment manufacturers. It can also be utilized in a number of different applications including MBE, and LPMOCVD among others. Interested parties should email .

####

About Meaglow Ltd.
Meaglow Ltd. produces a new range of epitaxy equipment (migration enhanced afterglow), MBE & MOCVD accessories, including custom built hollow cathode plasma sources.

For more information, please click here

Contacts:
Meaglow Ltd.
1 807 252 4391

Box 398, 2400 Nipigon Rd
Thunder Bay, P7C 4W1, ON, Canada

Copyright © Marketwire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

'Stealth' nanoparticles could improve cancer vaccines October 1st, 2014

Stressed Out: Research Sheds New Light on Why Rechargeable Batteries Fail October 1st, 2014

New Absorber Will Lead to Better Biosensor: Biosensors are more sensitive and able to detect smaller changes in the environment October 1st, 2014

Graphene chips are close to significant commercialization October 1st, 2014

Chip Technology

$18-million NSF investment aims to take flat materials to new heights: 2-D alternatives to graphene may enable exciting advances in electronics, photonics, sensors and other applications October 1st, 2014

Breakthrough in ALD-graphene by Picosun technology October 1st, 2014

Graphene chips are close to significant commercialization October 1st, 2014

Speed at its limits September 30th, 2014

Announcements

'Stealth' nanoparticles could improve cancer vaccines October 1st, 2014

Stressed Out: Research Sheds New Light on Why Rechargeable Batteries Fail October 1st, 2014

New Absorber Will Lead to Better Biosensor: Biosensors are more sensitive and able to detect smaller changes in the environment October 1st, 2014

Graphene chips are close to significant commercialization October 1st, 2014

Tools

Breakthrough in ALD-graphene by Picosun technology October 1st, 2014

Novel approach to magnetic measurements atom-by-atom October 1st, 2014

Stressed Out: Research Sheds New Light on Why Rechargeable Batteries Fail October 1st, 2014

Yale University and Leica Microsystems Partner to Establish Microscopy Center of Excellence: Yale Welcomes Scientists to Participate in Core Facility Opening and Super- Resolution Workshops October 20 Through 31, 2014 September 30th, 2014

Industrial

Park Systems Announces Outsourced Analytical Services Including AFM Surface Imaging, Data Analysis and Interpretation September 30th, 2014

Graphene and Amaranthus Superparamagnets: Breakthrough nanoparticles discovery of Indian researcher September 23rd, 2014

Wear-resistant ceramic powder maximises component lifespan in high-stress applications: Innovnano’s nanostructured 3YSZ offers improved tribological performance for manufacturing components September 18th, 2014

Industrial waste converted in coating for aircraft turbines September 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE