Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Meaglow Plasma Source Provides Major Breakthrough for Advanced Semiconductor Production Technique

Abstract:
Meaglow Ltd. (Privately Held) announces a breakthrough in semiconductor production. As computer chips become smaller and smaller, advanced production techniques, such as Atomic Layer Deposition (ALD) have become more important for depositing thin layers of material. Unfortunately the ALD of some materials has been prone to contamination from the plasma sources used. Meaglow Ltd has developed a hollow cathode plasma source which has reduced oxygen contamination by orders of magnitude, allowing the reproducible deposition of semiconductor materials with improved quality.

Meaglow Plasma Source Provides Major Breakthrough for Advanced Semiconductor Production Technique

Thunder Bay, Canada | Posted on March 13th, 2014

The breakthrough has been shown in a recent publication of oxygen reduction figures for the hollow cathode plasma source supplied last year to the group of Professor Necmi Biyikli, of the Institute of Materials Science and Nanotechnology, at Bilkent University in Turkey. The plasma source was used to upgrade their existing Atomic Layer Deposition (ALD) system by replacing an inductively coupled plasma source. The publication in the Journal of Materials Chemistry C (J. Mater. Chem. C 2 (2014) 2123) shows a reduction in oxygen content of orders of magnitude compared to previous results. There is also a marked improvement in material quality. These results render the older inductively coupled plasma sources obsolete for many applications.

Meaglow is seeking other customers interested in improving the material quality of their ALD and other plasma grown nitride layers. The hollow cathode plasma technology also has the advantage of scalability to large deposition areas. The Plasma source can be used to retrofit existing systems or can be integrated with equipment manufacturers. It can also be utilized in a number of different applications including MBE, and LPMOCVD among others. Interested parties should email .

####

About Meaglow Ltd.
Meaglow Ltd. produces a new range of epitaxy equipment (migration enhanced afterglow), MBE & MOCVD accessories, including custom built hollow cathode plasma sources.

For more information, please click here

Contacts:
Meaglow Ltd.
1 807 252 4391

Box 398, 2400 Nipigon Rd
Thunder Bay, P7C 4W1, ON, Canada

Copyright © Marketwire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Aculon Hires New Business Development Director December 19th, 2014

How does enzymatic pretreatment affect the nanostructure and reaction space of lignocellulosic biomass? December 18th, 2014

Silicon Valley-Based Foresight Valuation Launches STR-IPô, a New Initiative for Startups to Discover the Value of Their Intellectual Property December 18th, 2014

Iranian Scientists Use Nanotechnology to Increase Power, Energy of Supercapacitors December 18th, 2014

Chip Technology

Switching to spintronics: Berkeley Lab reports on electric field switching of ferromagnetism at room temp December 17th, 2014

Pb islands in a sea of graphene magnetise the material of the future December 16th, 2014

Stanford team combines logic, memory to build a 'high-rise' chip: Today circuit cards are laid out like single-story towns; Futuristic architecture builds layers of logic and memory into skyscraper chips that would be smaller, faster, cheaper -- and taller December 15th, 2014

Stacking two-dimensional materials may lower cost of semiconductor devices December 11th, 2014

Announcements

Aculon Hires New Business Development Director December 19th, 2014

How does enzymatic pretreatment affect the nanostructure and reaction space of lignocellulosic biomass? December 18th, 2014

Silicon Valley-Based Foresight Valuation Launches STR-IPô, a New Initiative for Startups to Discover the Value of Their Intellectual Property December 18th, 2014

Iranian Scientists Use Nanotechnology to Increase Power, Energy of Supercapacitors December 18th, 2014

Tools

Switching to spintronics: Berkeley Lab reports on electric field switching of ferromagnetism at room temp December 17th, 2014

ORNL microscopy pencils patterns in polymers at the nanoscale December 17th, 2014

Unraveling the light of fireflies December 17th, 2014

DELMIC reports on applications of their SPARC technology at the Chalmers University of Technology in Gothenburg, Sweden December 16th, 2014

Industrial

Dartmouth researchers create 'green' process to reduce molecular switching waste December 15th, 2014

Industrial Nanotech, Inc. Expands Government and Defense Projects December 10th, 2014

Simple, Biocompatible Method Developed for Production of Cerium Oxide Nanoparticles December 9th, 2014

A*STAR SIMTech wins international award for breaking new ground in actuators: SIMTech invention can be used in an array of industries, and is critical for next generation ultra-precision systems November 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE