Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Eulitha unveils new photolithography system “Phabler 100” for photonic patterning

Abstract:
Eulitha AG, A Swiss based company specializing in novel nano lithography technologies, today announced the availability of a new photo-lithography system PhableR 100 for printing high resolution nano-structures, especially for research and development applications as well as pilot and low-volume production use. The system particularly targets the production of periodic patterns such as gratings and photonic crystals required in optics and photonics.

Eulitha unveils new photolithography system “Phabler 100” for photonic patterning

Villigen, Switzerland | Posted on December 12th, 2013

The PhablerR 100 system is based on the proprietary PHABLE (short for Photonics Enabler) photolithographic technology developed by Eulitha AG, which makes it possible to print high-resolution structures in a non-contact, proximity photolithography system. The resolution obtained with the "PhableR 100" is essentially the same as what is obtainable from a DUV projection lithography system, but without the complex and expensive optics and mechanics of such a system. For example, linear gratings with a half-pitch of 150nm can be printed with high uniformity with the new system. As an added advantage, the practically unlimited depth of focus of the image formed by the PhableR 100 system means that the high-resolution patterns can be printed with high uniformity even onto non-flat substrates, which are commonly encountered in photonics applications.

The PhableR 100 system can expose substrates with diameters up to 100mm using industry standard chrome-on-glass or phase-shifting masks. The mask and the substrate are loaded manually onto the system and the exposure process is controlled by an onboard computer. Standard i-line photoresists, both positive and negative tone, which are available from common vendors, can be used. Linear or curved gratings, 2D photonic-crystal type patterns with hexagonal or square symmetry can be printed with feature periods less than 300nm. The system may also be used like a standard mask-aligner in either proximity or contact mode to print micron-scale structures. Targeted applications include research and development projects in photonics, fabrication of gratings for optical diffraction and spectroscopy, light extraction patterns on LEDs, patterned sapphire substrates and color filters.

Harun Solak, CEO of Eulitha AG stated "we are proud to introduce a solution that will enable our customers to perform high resolution photolithography with a low-cost system for the first time. This equipment is a result of a long-term development effort at both the Paul Scherrer Institut and Eulitha." The system is available for immediate demonstration at the Eulitha site in Switzerland. The PhableR 100 system will be presented at the 13th International Nanotechnology Exhibition which will take place between, January 29-21, 2013 in Tokyo, Japan.

####

About Eulitha AG
Eulitha AG is a spin-off company of the Paul Scherrer Institute, Switzerland. It specializes in the development of lithographic technologies for applications in photonics, biotech. It produces and markets nano-patterned samples and templates using its own PHABLE tools and state-of-the-art e-beam lithography systems. PHABLE is the brand name of its proprietary photolithography platform, which includes exposure tools and wafer patterning services.

For more information, please click here

Contacts:
Harun H. Solak
CEO
Tel: +41 56 310 4279


Rene Wilde
Sales Director
Tel: +41 56 281 2154

Copyright © Eulitha AG

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Researchers engineer improvements of technology used in digital memory November 24th, 2014

Research reveals how our bodies keep unwelcome visitors out of cell nuclei November 24th, 2014

An Inside Job: UC-Designed Nanoparticles Infiltrate, Kill Cancer Cells From Within November 24th, 2014

Cooling with the coldest matter in the world November 24th, 2014

Announcements

Research reveals how our bodies keep unwelcome visitors out of cell nuclei November 24th, 2014

ASU, IBM move ultrafast, low-cost DNA sequencing technology a step closer to reality November 24th, 2014

An Inside Job: UC-Designed Nanoparticles Infiltrate, Kill Cancer Cells From Within November 24th, 2014

Cooling with the coldest matter in the world November 24th, 2014

Tools

Iranian Experts Clean Uranium-Contaminated Water by Nano-Particles November 23rd, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

Spectral Surface Mapping with Microscopic Resolution: CRAIC Technologies introduces Spectral Surface Mapping™ (S2M™) software November 18th, 2014

Events/Classes

3rd Iran-Proposed Nano Standard Approved by International Standard Organization November 22nd, 2014

Sustainable Nanotechnologies Project November 20th, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

Printing/Lithography/Inkjet/Inks

Canatu Launches CNB In-Mold Film for Transparent Touch on 3D Surfaces –in Cars, Household Appliances, Wearables, Portables November 20th, 2014

SouthWest NanoTechnologies to Demonstrate 3D Capacitive Touch Sensor Featuring Transparent, Thermoformed Carbon Nanotube Ink at Printed Electronics USA 2014 (Booth J25) -- “Conductive and Semiconducting Single-Wall Carbon Nanotube Inks” will be Topic of Company Presentation November 10th, 2014

Longhorn beetle inspires ink to fight counterfeiting November 5th, 2014

'Nanomotor lithography' answers call for affordable, simpler device manufacturing October 31st, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE