Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH to Demonstrate Advances and Technical Breakthroughs at SPIE 2013: Papers showcase leadership in advancing EUV extendibility and metrology techniques for defect inspection and 3D TSVs

Abstract:
SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2013 conferences taking place February 25-28 at the San Jose Convention Center and Marriott in San Jose, CA.

SEMATECH to Demonstrate Advances and Technical Breakthroughs at SPIE 2013: Papers showcase leadership in advancing EUV extendibility and metrology techniques for defect inspection and 3D TSVs

Albany, NY | Posted on February 19th, 2013

"We are enthusiastic about sharing our progress on some of the most critical aspects of the development of EUV infrastructure," said Stefan Wurm, director of lithography at SEMATECH. "SEMATECH lithographers will recount achievements in multiple areas of EUV to further enable EUVL pilot line readiness and advance EUV extendibility."

SEMATECH engineers will report progress on EUV mask infrastructure, manufacturability, extendibility and metrology, and will showcase some of their findings in over 30 papers and posters demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, e-beam and nanoimprint.

More importantly, the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to production. In one area of investigation, technologists from SEMATECH's Mask Blank Development Center will report progress with its multilayer deposition process, including recent defect printability results from an NXE3100 tool with comparison of the imaging to various simulation modeling approaches.

Other SEMATECH papers will showcase advances in metrology techniques, photoresist shrinkage, nanopolishing, scatterometry, through-silicon via (TSV) reveal, transmission electron microscopy (TEM) tomography, critical dimension atomic force microscopy (CD-AFM), critical dimension X-ray scattering (CD-SAXS)—a potential metrology technique for FinFET and 3D memory structures—and a through-focus scanning optical microscopy (TSOM) technique being explored for future defect inspection or to enable high-volume manufacturing of high-aspect ratio features.

Additionally, technologists will present a "big picture" CD metrology gaps analysis, which interrelates the combined results from years of SEMATECH CD metrology studies to summarize the outlook for various tool technologies for different applications.

"We will be showcasing impressive metrology advances achieved through collaborative research, as well as revealing new defect characterization results for EUV mask blanks that form the basis of the technology for SEMATECH's new Nanodefect Center," said Michael Lercel, senior director of nanodefectivity and metrology at SEMATECH.

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

For a complete list of SEMATECH presentations at SPIE please visit bit.ly/VHBzTw.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
Phone: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

NMTI announces breakthrough solutions for HAMR nanoantenna for next-generation ultra-high density magnetic storage November 21st, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Silver Nanoparticles Produced in Iran from Forest Plants Extract November 20th, 2014

Nano Sorbents Able to Remove Pollutions Caused by Oil Derivatives November 20th, 2014

Chip Technology

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers create & control spin waves, lifting prospects for enhanced info processing November 17th, 2014

VDMA Electronics Production Equipment: Growth track for 2014 and 2015 confirmed: Business climate survey shows robust industry sector November 14th, 2014

Announcements

NMTI announces breakthrough solutions for HAMR nanoantenna for next-generation ultra-high density magnetic storage November 21st, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Silver Nanoparticles Produced in Iran from Forest Plants Extract November 20th, 2014

Nano Sorbents Able to Remove Pollutions Caused by Oil Derivatives November 20th, 2014

Tools

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

Two sensors in one: Nanoparticles that enable both MRI and fluorescent imaging could monitor cancer, other diseases November 18th, 2014

Field-emission plug-and-play solution for microwave electron guns: To simplify the electron emission mechanism involved in microwave electron guns, a team of researchers has created and demonstrated a field-emission plug-and-play solution based on ultrananocrystalline diamond November 18th, 2014

Events/Classes

Sustainable Nanotechnologies Project November 20th, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

Arrowhead to Present at Upcoming Conferences November 15th, 2014

Alliances/Partnerships/Distributorships

UO-industry collaboration points to improved nanomaterials: University of Oregon microscope puts spotlight on the surface structure of quantum dots for designing new solar devices November 20th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Field-emission plug-and-play solution for microwave electron guns: To simplify the electron emission mechanism involved in microwave electron guns, a team of researchers has created and demonstrated a field-emission plug-and-play solution based on ultrananocrystalline diamond November 18th, 2014

VDMA Electronics Production Equipment: Growth track for 2014 and 2015 confirmed: Business climate survey shows robust industry sector November 14th, 2014

Printing/Lithography/Inkjet/Inks

Canatu Launches CNB In-Mold Film for Transparent Touch on 3D Surfaces –in Cars, Household Appliances, Wearables, Portables November 20th, 2014

SouthWest NanoTechnologies to Demonstrate 3D Capacitive Touch Sensor Featuring Transparent, Thermoformed Carbon Nanotube Ink at Printed Electronics USA 2014 (Booth J25) -- “Conductive and Semiconducting Single-Wall Carbon Nanotube Inks” will be Topic of Company Presentation November 10th, 2014

Longhorn beetle inspires ink to fight counterfeiting November 5th, 2014

'Nanomotor lithography' answers call for affordable, simpler device manufacturing October 31st, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE