Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > PTB measurements for the next computer chip generation: Cooperation between Carl Zeiss and PTB on EUV lithography extended

Beamlines and instrumentation at the Metrology Light Source (MLS). (EUV beamline: #3; set-up for the calibration of radiation sources: #2b; undulator beamline: #1d; infrared beamline: #6)(Image: PTB)
Beamlines and instrumentation at the Metrology Light Source (MLS). (EUV beamline: #3; set-up for the calibration of radiation sources: #2b; undulator beamline: #1d; infrared beamline: #6)

(Image: PTB)

Abstract:
European companies are the world leaders in the development of EUV lithography for the manufacture of semiconductor chips with even shorter wavelengths than up to now, i.e. with 13.5 nanometres in the spectral range of the so-called "Extreme UV (EUV)". The volume production of lens systems and wafer scanners of EU lithography (EUVL) is planned for 2014. In this development, the Physikalisch-Technische Bundesanstalt (PTB) is at the fore. With a new EUV beamline at PTB's own electron storage ring - the Metrology Light Source (MLS) in Berlin-Adlershof - it will characterize EUVL lens systems for this purpose. The cooperation with Carl Zeiss SMT GmbH, which has been running since 1998, has now been extended for another four years. PTB measurements will help to give proof of the quality of the Zeiss lens systems in the so-called "steppers" (lithography machines) of the Dutch company ASML, the global market leader in this field.

PTB measurements for the next computer chip generation: Cooperation between Carl Zeiss and PTB on EUV lithography extended

Braunschweig , Germany | Posted on December 2nd, 2012

The combination is unique worldwide: although there are a number of electron storage rings, and although a national metrology institute exists in almost every country as the highest authority in the field of measurements, only the Physikalisch-Technische Bundesanstalt has its own modern electron storage ring - the Metrology Light Source - and the measurement arrangements required for the high-precision characterization of EUVL lens systems. The MLS has been operated since 2008; it furnishes synchrotron radiation from the terahertz range up to the EUV range and has clearly extended PTB's measurement capabilities at the nearby electron storage ring BESSY II, where it uses X-rays on a large scale for the various metrological tasks.

The new EUV beamline is particularly suited for the investigation of photodetectors and structured optical elements and has - after the commissioning phase - been increasingly used since the beginning of this year for measurements within the scope of research cooperations, in particular for EUVL. "Our greatest strength - which is very well received by the cooperation partners - consists in the so-called "At-wavelength measurements". We characterize the lens systems at the EUVL working wavelength - and not only with visible light. Our measurements therefore directly describe the behaviour of lens systems in the production machines", explains Frank Scholze, head of the PTB working group.

The great demand from industry had induced PTB to develop its measurement capabilities at the two storage rings even further. In mid-2013, the large EUV reflectometer of BESSY II is to move to the MLS. In its place, an EUV scatterometer/ellipsometer will be installed which has been particularly suited for scatter experiments. Then, at the latest, a total of approximately 6000 hours of synchrotron radiation measuring time per year will be available to PTB for EUV metrology.

Also in other areas, PTB has clearly extended the field of "metrology with synchrotron radiation" by the commissioning of new beamlines at the MLS. Compared to its predecessor at BESSY II, a new measuring set-up for the calibration of radiation sources now also allows measurements to be carried out at wavelengths below 40 nm. Calibrated radiation sources in the vacuum-UV (VUV) and the EUV are, for example, of great importance for the characterization of space telescopes for solar and atmospheric research. In addition, the new undulator beamline provides monochromatized intensive and profoundly polarized radiation from the IR range up to the EUV range. At present, the first quantitative investigations of surfaces are being carried out by means of UV/VUV ellipsometry and electron spectroscopy together with partners from the research site Adlershof. Furthermore, a new near-field microscope has been put into operation at the infrared beamline of the MLS.

####

About Physikalisch-Technische Bundesanstalt (PTB)
PTB is the German national metrology institute providing scientific and technical services. PTB measures with the highest accuracy and reliability metrology as the core competence

For more information, please click here

Contacts:
Dr. Frank Scholze
PTB Working Group 7.12
EUV Radiometry
Phone: +49(30) 3481-7120

Copyright © AlphaGalileo

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Shining rings: A new material emits white light when exposed to electricity: New synthetic approach could spark development of other dynamic materials July 24th, 2017

Ultrathin device harvests electricity from human motion July 23rd, 2017

The July 23 close fly-by of asteroid 2017 BS5 is explored in a Q&A with Dr. John S. Lewis, chief scientist at Deep Space Industries July 23rd, 2017

Scientists announce the quest for high-index materials: All-dielectric nanophotonics: The quest for better materials and fabrication techniques July 22nd, 2017

Pulses of electrons manipulate nanomagnets and store information: Scientists use electron pulses to create and manipulate nanoscale magnetic excitations that can store data July 21st, 2017

Imaging

Scientists announce the quest for high-index materials: All-dielectric nanophotonics: The quest for better materials and fabrication techniques July 22nd, 2017

Coupling a nano-trumpet with a quantum dot enables precise position determination July 14th, 2017

Laboratories

Studying Argon Gas Trapped in Two-Dimensional Array of Tiny "Cages": Understanding how individual atoms enter and exit the nanoporous frameworks could help scientists design new materials for gas separation and nuclear waste remediation July 17th, 2017

News laser design offers more inexpensive multi-color output: Design can control color, intensity of light by varying cavity architecture July 11th, 2017

Argonne National Laboratorys Continuous ALD Technology Licensed Exclusively to Forge Nano July 7th, 2017

Chip Technology

Semiliquid chains pulled out of a sea of microparticles July 20th, 2017

A firefly's flash inspires new nanolaser light July 18th, 2017

GLOBALFOUNDRIES and VeriSilicon To Enable Single-Chip Solution for Next-Gen IoT Networks: Integrated solution leverages GFs 22FDX technology to decrease power, area, and cost for NB-IoT and LTE-M applications July 14th, 2017

Nanometrics to Announce Second Quarter Financial Results on August 1, 2017 July 14th, 2017

Announcements

Shining rings: A new material emits white light when exposed to electricity: New synthetic approach could spark development of other dynamic materials July 24th, 2017

Ultrathin device harvests electricity from human motion July 23rd, 2017

The July 23 close fly-by of asteroid 2017 BS5 is explored in a Q&A with Dr. John S. Lewis, chief scientist at Deep Space Industries July 23rd, 2017

Scientists announce the quest for high-index materials: All-dielectric nanophotonics: The quest for better materials and fabrication techniques July 22nd, 2017

Tools

Scientists announce the quest for high-index materials: All-dielectric nanophotonics: The quest for better materials and fabrication techniques July 22nd, 2017

Coupling a nano-trumpet with a quantum dot enables precise position determination July 14th, 2017

Nanometrics to Announce Second Quarter Financial Results on August 1, 2017 July 14th, 2017

Nanometrics Introduces SpectraProbe Analysis Software: Advanced software and algorithms enhancing Nanometrics metrology fleet capabilities fab-wide July 13th, 2017

Alliances/Trade associations/Partnerships/Distributorships

GLOBALFOUNDRIES and VeriSilicon To Enable Single-Chip Solution for Next-Gen IoT Networks: Integrated solution leverages GFs 22FDX technology to decrease power, area, and cost for NB-IoT and LTE-M applications July 14th, 2017

Advanced Nanomechanical Characterization Centre Open in India: Nanomechanics, Inc. announces the establishment of the joint technology development center in Hyderabad, India July 5th, 2017

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Cambridge Nanotherm partners with Inabata for global sales and distribution June 20th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project