Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > IMS Nanofabrication Announces Participation of TSMC in the Electron Multi-Beam Mask Writer Collaboration Joining Founding Members DNP, Intel, and Photronics

Abstract:
IMS Nanofabrication AG (IMS) (www.ims.co.at) announced today that Taiwan Semiconductor Manufacturing Co., Ltd. (TSMC) has joined IMS' multibeam mask writer development collaboration, adding its support to that of collaboration founding members Dai Nippon Printing Co., Ltd. (DNP), Intel Corporation and Photronics Inc. The purpose of the collaborative program is to develop an electron multi-beam mask writer for use in advanced mask lithography applications with the goal of meeting lithography specifications below 10nm while achieving high throughput requirements. The program is nearing the completion of a proof-of-concept phase, and the upcoming phase of the collaboration will focus on the design and construction of an alpha and beta version of the multi-beam mask writer.

IMS Nanofabrication Announces Participation of TSMC in the Electron Multi-Beam Mask Writer Collaboration Joining Founding Members DNP, Intel, and Photronics

Vienna, Austria | Posted on August 24th, 2012

"The newly started development of alpha and beta electron multi-beam mask writer tools is strongly supported by TSMC joining the collaboration with DNP, Intel, and Photronics," said Elmar Platzgummer, CEO / CTO of IMS.

C.S. Yoo, head of E-Beam Operation (EBO) at TSMC said: "We are pleased to work with IMS and other partners in the industry on this multi-beam mask writer project. We are very encouraged by this partnership's goal of producing a mask writer with both accuracy and high productivity around 2015 for nodes beyond 10 nanometers. This project shows great potential for producing that breakthrough."

The founding members welcome the addition of TSMC and believe that the collaboration demonstrates solid industry support from both merchant mask makers and captive mask shops. IMS believes that by enlisting customers early in the development phase, the design and operation of this new architecture will readily adapt to the needs of a high volume manufacturing environment. The collaboration participants will provide input to IMS on mask manufacturing issues that are critical to leading-edge device manufacturers and to leading merchant mask makers. Collaboration members expect to benefit from early access to the electron mask exposure tool (eMET) technology and from the commercialization of the technology in partnership with additional industry players. This collaboration is representative of a new approach to managing development programs that are needed to address critical demands in mask making.

####

About IMS Nanofabrication AG (IMS)
IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with the strategic investors participating in this funding round and with other parties involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit: www.ims.co.at

About DNP

DNP is one of the world's largest comprehensive printing companies. DNP's wide range of businesses include publication printing, commercial printing, smart cards, business forms, network business and electronic components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cutting- edge photomasks. For more information on DNP, please visit: www.dnp.co.jp/eng/

About Intel

Intel (NASDAQ: INTC) is a world leader in computing innovation. The company designs and builds the essential technologies that serve as the foundation for the world’s computing devices. Additional information about Intel is available at newsroom.intel.com and blogs.intel.com

Intel is a trademark of Intel Corporation in the United States and other countries.

About Photronics

Photronics Inc. is a leading worldwide manufacturer of photomasks. Photomasks are high precision quartz plates that contain microscopic images of electronic circuits. A key element in the manufacture of semiconductors and flat panel displays, photomasks are used to transfer circuit patterns onto semiconductor wafers and flat panel substrates during the fabrication of integrated circuits, a variety of flat panel displays and, to a lesser extent, other types of electrical and optical components. They are produced in accordance with product designs provided by customers at strategically located manufacturing facilities in Asia, Europe, and North America. Additional information on the Company can be accessed at: www.photronics.com

About TSMC

Established in 1987, TSMC is the world's first dedicated semiconductor foundry. As the founder and a leader of the Dedicated IC Foundry segment, TSMC has built its reputation by offering advanced and "More-than-Moore" wafer production processes and unparalleled manufacturing efficiency. From its inception, TSMC has consistently offered the foundry segment's leading technologies and TSMC COMPATIBLE® design services. TSMC has consistently experienced strong growth by building solid partnerships with its customers, large and small. IC suppliers from around the world trust TSMC with their manufacturing needs, thanks to its unique integration of cutting-edge process technologies, pioneering design services, manufacturing productivity and product quality. Additional information on the Company can be accessed at: www.tsmc.com

For more information, please click here

Contacts:
IMS Nanofabrication AG
Dr. Hans Loeschner

+43 699 123 67 223

Copyright © Business Wire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nuclear pores captured on film: Using an ultra fast-scanning atomic force microscope, researchers from the University of Basel have filmed 'living' nuclear pore complexes at work for the first time May 3rd, 2016

Little ANTs: Researchers build the world's tiniest engine May 3rd, 2016

An Experiment Seeks to Make Quantum Physics Visible to the Naked Eye May 3rd, 2016

Quantum sensors for high-precision magnetometry of superconductors May 3rd, 2016

Chip Technology

Spintronics for future information technologies: Spin currents in topological insulators controlled May 2nd, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016

Announcements

Nuclear pores captured on film: Using an ultra fast-scanning atomic force microscope, researchers from the University of Basel have filmed 'living' nuclear pore complexes at work for the first time May 3rd, 2016

Little ANTs: Researchers build the world's tiniest engine May 3rd, 2016

An Experiment Seeks to Make Quantum Physics Visible to the Naked Eye May 3rd, 2016

Quantum sensors for high-precision magnetometry of superconductors May 3rd, 2016

Tools

Making invisible physics visible: The Jayich Lab has created a new sensor technology that captures nanoscale images with high spatial resolution and sensitivity May 2nd, 2016

Exploring phosphorene, a promising new material April 29th, 2016

JPK reports on the use of a NanoWizard AFM system at the University of Kaiserslautern to study the interaction of bacteria with microstructured surfaces April 28th, 2016

Chemists use DNA to build the world's tiniest thermometer April 27th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Electrically Conductive Graphene Ink Enables Printing of Biosensors April 23rd, 2016

Leti Extends Collaboration with Qualcomm on CoolCubeTM 3D Integration Technology for High-Density, High-Performance ICs: Collaboration Goals Include Building an Ecosystem To Take the Chip-stacking Technology from Design to Fabrication April 13th, 2016

FEI Partners with Five Pharmaceutical Companies, the Medical Research Council and the University of Cambridge to form Cryo-EM Research Consortium April 5th, 2016

Strem Chemicals and SONA Nanotech Sign Distribution Agreement for the World’s First Gold Nanorods Synthesized without CTAB February 24th, 2016

Research partnerships

Making invisible physics visible: The Jayich Lab has created a new sensor technology that captures nanoscale images with high spatial resolution and sensitivity May 2nd, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Personal cooling units on the horizon April 29th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic