Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > IMS Nanofabrication Announces Participation of TSMC in the Electron Multi-Beam Mask Writer Collaboration Joining Founding Members DNP, Intel, and Photronics

Abstract:
IMS Nanofabrication AG (IMS) (www.ims.co.at) announced today that Taiwan Semiconductor Manufacturing Co., Ltd. (TSMC) has joined IMS' multibeam mask writer development collaboration, adding its support to that of collaboration founding members Dai Nippon Printing Co., Ltd. (DNP), Intel Corporation and Photronics Inc. The purpose of the collaborative program is to develop an electron multi-beam mask writer for use in advanced mask lithography applications with the goal of meeting lithography specifications below 10nm while achieving high throughput requirements. The program is nearing the completion of a proof-of-concept phase, and the upcoming phase of the collaboration will focus on the design and construction of an alpha and beta version of the multi-beam mask writer.

IMS Nanofabrication Announces Participation of TSMC in the Electron Multi-Beam Mask Writer Collaboration Joining Founding Members DNP, Intel, and Photronics

Vienna, Austria | Posted on August 24th, 2012

"The newly started development of alpha and beta electron multi-beam mask writer tools is strongly supported by TSMC joining the collaboration with DNP, Intel, and Photronics," said Elmar Platzgummer, CEO / CTO of IMS.

C.S. Yoo, head of E-Beam Operation (EBO) at TSMC said: "We are pleased to work with IMS and other partners in the industry on this multi-beam mask writer project. We are very encouraged by this partnership's goal of producing a mask writer with both accuracy and high productivity around 2015 for nodes beyond 10 nanometers. This project shows great potential for producing that breakthrough."

The founding members welcome the addition of TSMC and believe that the collaboration demonstrates solid industry support from both merchant mask makers and captive mask shops. IMS believes that by enlisting customers early in the development phase, the design and operation of this new architecture will readily adapt to the needs of a high volume manufacturing environment. The collaboration participants will provide input to IMS on mask manufacturing issues that are critical to leading-edge device manufacturers and to leading merchant mask makers. Collaboration members expect to benefit from early access to the electron mask exposure tool (eMET) technology and from the commercialization of the technology in partnership with additional industry players. This collaboration is representative of a new approach to managing development programs that are needed to address critical demands in mask making.

####

About IMS Nanofabrication AG (IMS)
IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with the strategic investors participating in this funding round and with other parties involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit: www.ims.co.at

About DNP

DNP is one of the world's largest comprehensive printing companies. DNP's wide range of businesses include publication printing, commercial printing, smart cards, business forms, network business and electronic components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cutting- edge photomasks. For more information on DNP, please visit: www.dnp.co.jp/eng/

About Intel

Intel (NASDAQ: INTC) is a world leader in computing innovation. The company designs and builds the essential technologies that serve as the foundation for the world’s computing devices. Additional information about Intel is available at newsroom.intel.com and blogs.intel.com

Intel is a trademark of Intel Corporation in the United States and other countries.

About Photronics

Photronics Inc. is a leading worldwide manufacturer of photomasks. Photomasks are high precision quartz plates that contain microscopic images of electronic circuits. A key element in the manufacture of semiconductors and flat panel displays, photomasks are used to transfer circuit patterns onto semiconductor wafers and flat panel substrates during the fabrication of integrated circuits, a variety of flat panel displays and, to a lesser extent, other types of electrical and optical components. They are produced in accordance with product designs provided by customers at strategically located manufacturing facilities in Asia, Europe, and North America. Additional information on the Company can be accessed at: www.photronics.com

About TSMC

Established in 1987, TSMC is the world's first dedicated semiconductor foundry. As the founder and a leader of the Dedicated IC Foundry segment, TSMC has built its reputation by offering advanced and "More-than-Moore" wafer production processes and unparalleled manufacturing efficiency. From its inception, TSMC has consistently offered the foundry segment's leading technologies and TSMC COMPATIBLE® design services. TSMC has consistently experienced strong growth by building solid partnerships with its customers, large and small. IC suppliers from around the world trust TSMC with their manufacturing needs, thanks to its unique integration of cutting-edge process technologies, pioneering design services, manufacturing productivity and product quality. Additional information on the Company can be accessed at: www.tsmc.com

For more information, please click here

Contacts:
IMS Nanofabrication AG
Dr. Hans Loeschner

+43 699 123 67 223

Copyright © Business Wire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Chip Technology

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

Announcements

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Tools

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Bruker Announces Acquisition of High-Speed, 3D Super-Resolution Fluorescence Microscopy Company Vutara July 28th, 2014

Malvern Instruments completes acquisition of MicroCal and announces purchase of Archimedes product from Affinity Biosensors July 25th, 2014

Alliances/Partnerships/Distributorships

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

Organometallics welcomes new editor-in-chief: Paul Chirik, Ph.D. July 22nd, 2014

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

SentiMag® Now Available in Australia and New Zealand July 21st, 2014

Research partnerships

Breakthrough laser experiment reveals liquid-like motion of atoms in an ultra-cold cluster: University of Leicester research team unlocks insights into creation of new nano-materials July 25th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE