Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > KLA-Tencor™ Announces eDR™-7000 Electron-Beam Wafer Defect Review System

Abstract:
Today KLA-Tencor Corporation™ (NASDAQ: KLAC) announced a critical enabling tool for chip manufacturing at the 20nm device nodes and below: the eDR™-7000 electron-beam (e-beam) wafer defect review system. Featuring technology breakthroughs that produce industry-leading sensitivity and throughput, the eDR-7000 addresses defect imaging and classification challenges at today's leading edge—where yield-killing defects can be as small as 10nm, or located at the bottom of a deep trench or hole. The eDR-7000 is the only tool in its class to reliably identify defects down to the sensitivity thresholds of wafer defect inspection systems designed for the 20nm node. These include the Surfscan® SP3, introduced last month, and KLA-Tencor's upcoming models in the patterned wafer inspection product lines.

KLA-Tencor™ Announces eDR™-7000 Electron-Beam Wafer Defect Review System

Milpitas, CA | Posted on August 15th, 2011

"The eDR-7000 offers the opportunity to thoroughly understand the defect population on the wafer," said Cecelia Campochiaro, Ph.D., vice president and general manager of KLA-Tencor's e-Beam Technology division. "This new tool is able to re-locate and image 10nm defects and defect types that are typically missed by currently available review systems. It can review multiple defects per second —primarily because it can drive directly to the site of the defect at high resolution, without having to take the intermediate, time-consuming step of locating the defect at lower magnification, and then zooming in for a clear image. With the outstanding quality and quantity of data afforded by the eDR-7000, engineers are equipped to take appropriate corrective action based on an accurate representation of the defect population."

The leading-edge capabilities of the eDR-7000 are enabled by the following new features and improvements over the current-generation eDR-5210 platform:

- Third-generation, field-tested e-beam immersion column, for higher resolution and improved topographic imaging;
- Advanced stage and vibration-isolation system, for a three-fold improvement in coordinate accuracy and up to a four-fold increase in defect review speed;
- Dramatically improved sensitivity to defects on bare wafers, including enhancements to energy-dispersive x-ray (EDX) composition analysis;
- Unique reticle defect review mode, for rapid investigation of sites on the wafer where reticle defects may have printed;
- Process window characterization at significantly greater throughput;
- Voltage-contrast imaging mode for review of e-beam wafer inspection data; and
- Offline defect classification capability to increase the tool's availability for imaging work.

Several orders have been received for eDR-7000 systems from leading logic, memory, foundry, and equipment manufacturers. Multiple systems are already in use in advanced development and production lines. To maintain high performance and productivity, the eDR-7000 tools are backed by KLA-Tencor's global, comprehensive service network. For more information on KLA-Tencor's e-beam review systems, please visit the product web pages at: www.kla-tencor.com/defect-review/edr-7000-series.html.

####

About KLA-Tencor Corporation™
KLA-Tencor Corporation (NASDAQ: KLAC), a leading provider of process control and yield management solutions, partners with customers around the world to develop state-of-the-art inspection and metrology technologies. These technologies serve the semiconductor, data storage, LED, photovoltaic, and other related nanoelectronics industries. With a portfolio of industry-standard products and a team of world-class engineers and scientists, the company has created superior solutions for its customers for over 30 years. Headquartered in Milpitas, California, KLA-Tencor has dedicated customer operations and service centers around the world. Additional information may be found at www.kla-tencor.com. (KLAC-P)

Forward Looking Statements:

Statements in this press release other than historical facts, such as statements regarding eDR-7000's expected performance, trends in the semiconductor industry (and the anticipated challenges associated with them),expected uses of the eDR-7000 by KLA-Tencor's customers, expected introduction by KLA-Tencor of new inspection systems, and the anticipated cost, operational and other benefits realizable by users of the eDR-7000 tools, are forward-looking statements, and are subject to the Safe Harbor provisions created by the Private Securities Litigation Reform Act of 1995. These forward-looking statements are based on current information and expectations, and involve a number of risks and uncertainties. Actual results may differ materially from those projected in such statements due to various factors, including delays in the adoption of new technologies (whether due to cost or performance issues or otherwise), the introduction of competing products by other companies or unanticipated technological challenges or limitations that affect the implementation, performance or use of KLA-Tencor's products.

For more information, please click here

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Lawrence Livermore researchers develop efficient method to produce nanoporous metals November 25th, 2014

Chip Technology

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers create & control spin waves, lifting prospects for enhanced info processing November 17th, 2014

Announcements

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Research yields material made of single-atom layers that snap together like Legos November 25th, 2014

Tools

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

A*STAR SIMTech wins international award for breaking new ground in actuators: SIMTech invention can be used in an array of industries, and is critical for next generation ultra-precision systems November 24th, 2014

Professional AFM Images with a Three Step Click SmartScan by Park Systems Revolutionizes Atomic Force Microscopy by Automatizing the Imaging Process November 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE