- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Vistec Lithography Inc., a leading supplier of electron-beam lithography systems, received a major order from Greece. The National Center for Scientific Research (NCSR Demokritos) has bought an EBPG5000plusES system for one of its associated Institutes. Installed at the Institute of Microelectronics (IMEL), the system will be the first 100kV lithography system in Greece and assure multidisciplinary cutting-edge nano-research.
IMEL is one of Europe's leading Research Institutes in the field of Silicon technologies that performs multidisciplinary research. Professor Dimitris Tsoukalas, Director of IMEL, explains: "Due to the different fields of research carried out at the IMEL we had very special demands for the new patterning system. It not only had to be capable of a multi user environment but also had to provide high class and efficient nano-lithography in all areas of our activities spanning from nanoelectronic devices to sensors and MEMS/NEMS. The EBPG5000plusES is the perfect match to these requirements and it will allow IMEL to further improve its position at the nanotechnology forefront."
The Vistec EBPG5000plusES is a high-performance lithography tool based on reliable and well-proven system architecture. Due to its electron-optical column the system can expose various substrate types. The system provides a spot size down to <2.2nm, which allows the routinely generation of nano-dimensional features below 8nm. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse ?multi user environments."
Due to its expertise and infrastructure IMEL is the key institution for top-down nano-research in Greece. Rainer Schmid, General Manager at Vistec Lithography comments the order: "We are honoured to have received an order from an institute with such a reputation. The EBPG5000plusES will be the first 100kV system in Greece. That will not only enable the institute to maintain its leading role in national nano-research but also to participate in European research projects, networks of excellence, and technology platforms at the highest level."
The Vistec Electron Beam Lithography Group is a world leader in the design and manufacture of electron beam lithography systems and provides leading edge technology solutions for a wide range of applications.
The Group provides systems to both key semiconductor manufacturers as well as to Universities and Centres of Excellence. The application areas span a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and several new emerging markets.
For more information, please click here
Manager Strategic Marketing Litho
Tel.: +49 3641 651 955
Fax: +49 3641 651 922
D-07743 Jena (Germany)
Tel.: +49 3641 507 081
Copyright © VistecIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Gigantic ultrafast spin currents: Scientists from TU Wien (Vienna) are proposing a new method for creating extremely strong spin currents. They are essential for spintronics, a technology that could replace today's electronics May 25th, 2016
Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016